中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of deposition conditions on the microstructure of oxides thin films

文献类型:期刊论文

作者Tian Guanglei ; Wu Shigang ; Shu Kangying ; Qin Laishun ; Shao JD(邵建达)
刊名appl. surf. sci.
出版日期2007
卷号253期号:21页码:8782
关键词X-ray diffraction crystal structure nucleation oxides films
ISSN号0169-4332
中文摘要thin films of zro2, hfo2 and tio2 were deposited on kinds of substrates by electron beam evaporation (eb), ion assisted deposition (iad) and dual ion beam sputtering (dibs). then some of them were annealed at different temperatures. x-ray diffraction (xrd) was applied to determine the crystalline phase and the grain size of these films, and the results revealed that their microstructures strongly depended on the deposition conditions such as substrate, deposition temperature, deposition method and annealing temperature. theory of crystal growth and migratory diffusion were applied to explain the difference of crystalline structures between these thin films deposited and treated under various conditions. (c) 2007 elsevier b.v. all rights reserved.
学科主题光学薄膜
收录类别EI
语种英语
WOS记录号WOS:000249248100036
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4546]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Tian Guanglei,Wu Shigang,Shu Kangying,et al. Influence of deposition conditions on the microstructure of oxides thin films[J]. appl. surf. sci.,2007,253(21):8782, 8787.
APA Tian Guanglei,Wu Shigang,Shu Kangying,Qin Laishun,&邵建达.(2007).Influence of deposition conditions on the microstructure of oxides thin films.appl. surf. sci.,253(21),8782.
MLA Tian Guanglei,et al."Influence of deposition conditions on the microstructure of oxides thin films".appl. surf. sci. 253.21(2007):8782.

入库方式: OAI收割

来源:上海光学精密机械研究所

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