Effects of annealing on laser-induced damage threshold of TiO2/SiO2 high reflectors
文献类型：期刊论文
| 作者 | Yao JK(姚建可) ; Shao JD(邵建达) ; He HB(贺洪波) ; Fan ZX(范正修) |
| 刊名 | appl. surf. sci.
 |
| 出版日期 | 2007 |
| 卷号 | 253期号:22页码:8911 |
| 关键词 | annealing TiO2/SiO2 high reflectors absorption laser damage x-ray photoelectron spectroscopy |
| ISSN号 | 0169-4332 |
| 中文摘要 | the mechanism of improving 1064 nm, 12 ns laser-induced damage threshold (lidt) of tio2/sio2 high reflectors (hr) prepared by electronic beam evaporation from 5.1 to 13.1 j/cm(2) by thermal annealing is discussed. through optical properties, structure and chemical composition analysis, it is found that the reduced atomic non-stoichiometric defects are the main reason of absorption decrease and lidt rise after annealing. a remarkable increase of lidt is found at 300 degrees c annealing. the refractive index and film inhomogeneity rise, physical thickness decrease, and film stress changes from compress stress to tensile stress due to the structure change during annealing. (c) 2007 elsevier b.v. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000249484100017 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4548]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Yao JK,Shao JD,He HB,et al. Effects of annealing on laser-induced damage threshold of TiO2/SiO2 high reflectors[J]. appl. surf. sci.,2007,253(22):8911, 8914. |
| APA | 姚建可,邵建达,贺洪波,&范正修.(2007).Effects of annealing on laser-induced damage threshold of TiO2/SiO2 high reflectors.appl. surf. sci.,253(22),8911. |
| MLA | 姚建可,et al."Effects of annealing on laser-induced damage threshold of TiO2/SiO2 high reflectors".appl. surf. sci. 253.22(2007):8911. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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