中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Optical and electrical properties of TiOx thin films deposited by electron beam evaporation

文献类型:期刊论文

作者Yao JK(姚建可) ; Shao JD(邵建达) ; He HB(贺洪波) ; Fan ZX(范正修)
刊名vacuum
出版日期2007
卷号81期号:9页码:1023
关键词titanium monoxide electron beam evaporation Tio(x) thin film X-ray photoelectron spectroscopy
ISSN号0042-207x
中文摘要the tiox thin films were prepared by electron beam evaporation using tio as the starting material. the effect of the annealing temperature on the optical and electrical properties was investigated. the spectra of x-ray photoelectron spectroscopy reveal that ti in the films mainly exist in the forms of ti2+ and ti3+ below 400 degrees c 24h annealing. the charge transfer between different titanium ion contribute greatly to the color, absorption, and electrical resistance of the films. (c) 2006 elsevier ltd. all rights reserved.
学科主题光学薄膜
收录类别EI
语种英语
WOS记录号WOS:000247510200001
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4556]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Yao JK,Shao JD,He HB,et al. Optical and electrical properties of TiOx thin films deposited by electron beam evaporation[J]. vacuum,2007,81(9):1023, 1028.
APA 姚建可,邵建达,贺洪波,&范正修.(2007).Optical and electrical properties of TiOx thin films deposited by electron beam evaporation.vacuum,81(9),1023.
MLA 姚建可,et al."Optical and electrical properties of TiOx thin films deposited by electron beam evaporation".vacuum 81.9(2007):1023.

入库方式: OAI收割

来源:上海光学精密机械研究所

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