用不同的Mo靶溅射功率制备Mo／Si多层膜
文献类型：期刊论文
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| 作者 | 秦俊岭 ; 邵建达 ; 易葵 |
| 刊名 | 强激光与粒子束
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| 出版日期 | 2007 |
| 卷号 | 19期号:1页码:67 |
| 关键词 | Mo靶 Atomic force microscopy Mo／Si多层膜 Magnetron sputtering 溅射功率 Molybdenum 软X射线 Reflection 反射率 Surface morphology Surface roughness X ray diffraction analysis X rays |
| 其他题名 | Mo/Si multilayers prepared with different sputtering power of Mo target |
| 中文摘要 | 用磁控溅射法制备了周期厚度和周期数均相同的Mo／Si多层膜，用原子力显微镜和小角X射线衍射分别研究了Mo靶溅射功率不相同时，Mo／Si多层膜表面形貌和晶相的变化。随后在国家同步辐射实验室测量了Mo／Si多层膜的软X射线反射率。研究发现，随着Mo靶溅射功率的增大，Mo／Si多层膜的表面粗糙度增加，Mo的特征X射线衍射峰也增强，Mo／Si多层膜的软X射线峰值反射率先增大后减小。; abstract {Mo/Si multilayers were prepared by magnetron sputtering. With different sputtering power of Mo target, surface morphology and crystal phases of Mo/Si multilayers were studied by AFM and XRD. Soft X-ray reflectivity of Mo/Si multilayers were measured. As sputtering power of Mo target was increasing, surface roughness of Mo/Si film was increasing, characteristic diffraction peak of Mo species became stronger and stronger, furthermore, soft X-ray peak reflectivity of Mo/Si multilayers first increased and then reduced.} |
| 学科主题 | 光学薄膜 |
| 分类号 | O484.5 |
| 收录类别 | EI |
| 语种 | 中文 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4590]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | 秦俊岭,邵建达,易葵. 用不同的Mo靶溅射功率制备Mo／Si多层膜, Mo/Si multilayers prepared with different sputtering power of Mo target[J]. 强激光与粒子束,2007,19(1):67, 70. |
| APA | 秦俊岭,邵建达,&易葵.(2007).用不同的Mo靶溅射功率制备Mo／Si多层膜.强激光与粒子束,19(1),67. |
| MLA | 秦俊岭,et al."用不同的Mo靶溅射功率制备Mo／Si多层膜".强激光与粒子束 19.1(2007):67. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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