Mo／Si软X射线多层膜的界面粗糙度研究
文献类型：期刊论文
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| 作者 | 秦俊岭 ; 邵建达 ; 易葵 ; 周洪军 ; 霍同林 ; 范正修 |
| 刊名 | 强激光与粒子束
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| 出版日期 | 2007 |
| 卷号 | 19期号:5页码:763 |
| 关键词 | Mo／Si多层膜 Atomic force microscopy 软X射线 Magnetron sputtering 界面粗糙度 Surface roughness 反射率 X ray diffraction |
| 其他题名 | Interface roughness of Mo/Si soft X-ray multilayers |
| 中文摘要 | 用磁控溅射法分别制备了以Mo膜层和Si膜层为顶层的Mo／Si多层膜系列，利用小角X射线衍射确定了各多层膜的周期厚度。以不同周期数的Mo／Si多层膜的新鲜表面近似等同于同一多层膜的内界面，通过原子力显微镜研究了多层膜界面粗糙度随膜层数的变化规律。并在国家同步辐射实验室测量了各多层膜的软X射线反射率。研究表明：随着膜层数的增加，Mo膜层和Si膜层的界面粗糙度先减小后增加然后再减小，多层膜的峰值反射率先增加后减小。; abstract {A series of Mo/Si multilayers were prepared by magnetron sputtering, with top layers being Mo layer and Si layer respectively. Periodic length of Mo/Si multilayers were determined by small angle X-ray diffraction. As fresh surfaces of Mo/Si multilayers with different period number were approximatively equal to the interface of the same multilayer, interface roughness change law of multilayers as layer number increases was studied by atomic force microscope. Soft X-ray reflectivity of Mo/Si multilayers were measured in National Synchrotron Radiation Laboratory. As the number of layers increases, interface roughness and peak reflectivity of multilayers first increase and then reduce.} |
| 学科主题 | 光学薄膜 |
| 分类号 | O43 |
| 收录类别 | EI |
| 语种 | 中文 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4594]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | 秦俊岭,邵建达,易葵,等. Mo／Si软X射线多层膜的界面粗糙度研究, Interface roughness of Mo/Si soft X-ray multilayers[J]. 强激光与粒子束,2007,19(5):763, 766. |
| APA | 秦俊岭,邵建达,易葵,周洪军,霍同林,&范正修.(2007).Mo／Si软X射线多层膜的界面粗糙度研究.强激光与粒子束,19(5),763. |
| MLA | 秦俊岭,et al."Mo／Si软X射线多层膜的界面粗糙度研究".强激光与粒子束 19.5(2007):763. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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