中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
LBO晶体上1064,532nm倍频增透膜的镀制及性能分析

文献类型:期刊论文

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作者邓震霞 ; 贺洪波 ; 宋永香 ; 杨燕静 ; 范正修 ; 邵建达
刊名强激光与粒子束
出版日期2007
卷号19期号:8页码:1325
关键词薄膜 Adhesion LBO晶体 Annealing 倍频增透膜 Evaporation 过渡层 Optical properties 退火 Thermal expansion 热应力 Thermal stress 热膨胀系数 Thin films
其他题名Fabrication and performance evaluation of 1064, 532 nm frequency-doubled antireflection coating for LBO crystal
中文摘要用电子束蒸发沉积方法在X切LBO(X-LBO)晶体上镀制了两种不同膜系结构的1064和532nm倍频增透膜,其中一种膜系结构为基底/ZrO2/Y2O3/A12O3/SiO2/空气,另一种为基底/0.5Al2O3/ZrO2/Y2O3/A12O3/SiO2/空气,两种膜系结构的主要差别在于有无氧化铝过渡层。测量了薄膜的反射率光谱曲线,发现两种增透膜在1064和532nm处的反射率均小于0.5%,实际镀制结果与理论设计曲线的差异主要是由材料折射率的变化引起的。且对样品在空气环境中进行了温度为473K的退火处理,; abstract {Two different types of 1064, 532 nm frequency-doubled antireflection coatings for X-LBO were deposited by electron beam evaporation. One stack is substrate/ZrO2/Y2O3/ Al2O3/SiO2/air, and the other is substrate/Al2O3/ZrO2/Y2 O3/Al2O3/SiO2/air. The main difference between the two was the presence of alumina interlayer, and the optical behavior and adhesion between film and LBO substrate were investigated. Both coatings showed good optical performance that the reflectance of the coatings at 1064 nm or 532 nm is less than 0.5%, but the coating with alumina interlayer showed stronger adhesion after annealing at 473 K for 2 h by contrast with that without alumina interlayer, which indicated that the alumina interlayer helped the coating resist the strong thermal stress from the thermal expansion mismatch between film and LBO substrate and improved the adhesion.}
学科主题光学薄膜
分类号O484.4
收录类别EI
语种中文
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4596]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
邓震霞,贺洪波,宋永香,等. LBO晶体上1064,532nm倍频增透膜的镀制及性能分析, Fabrication and performance evaluation of 1064, 532 nm frequency-doubled antireflection coating for LBO crystal[J]. 强激光与粒子束,2007,19(8):1325, 1328.
APA 邓震霞,贺洪波,宋永香,杨燕静,范正修,&邵建达.(2007).LBO晶体上1064,532nm倍频增透膜的镀制及性能分析.强激光与粒子束,19(8),1325.
MLA 邓震霞,et al."LBO晶体上1064,532nm倍频增透膜的镀制及性能分析".强激光与粒子束 19.8(2007):1325.

入库方式: OAI收割

来源:上海光学精密机械研究所

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