低损耗193nm增透膜
文献类型：期刊论文
| 作者 | 尚淑珍 ; 邵建达 ; 范正修 |
| 刊名 | 物理学报
 |
| 出版日期 | 2008 |
| 卷号 | 57期号:3页码:1946 |
| ISSN号 | 1000-3290 |
| 关键词 | 193 nm AR coatings optical loss reflection |
| 其他题名 | Low-loss 193nm anti-reflection coatings |
| 中文摘要 | 计算了适用于193nm增透膜设计与制备的基底与薄膜材料的光学常数,并在此基础上对193nm增透膜进行了设计、制备与性能分析.发现基底材料的吸收损耗对增透膜元件的影响很大,超过一定值时,增透膜元件的设计透过率将达不到理想水平.对单面增透膜的设计与制备结果表明,当吸收损耗降低到一定程度,散射损耗成为不可忽略的因素.采用热舟蒸发方法实现了性能良好的193nm减反射膜,剩余反射率在0.2%以下.; The optical constants suitable for designing and depositing 193nm AR coatings were calculated, and 193nm AR coatings were designed, produced and characterized on the basis of the calculated results. It was found that the extinction loss of the substrate material had such an important effect that when it was beyond a certain level the designed transmittance could not reach the ideal value. The designed and manufactured results of the single-surface AR coatings revealed that scattering loss began to play the key role when the absorbance loss decreased to a certain extent. High performance 193nm AR coatings with residual reflectance lower than 0.2% have been prepared by the resistant boat evaporation method. |
| 学科主题 | 光学薄膜 |
| 语种 | 英语 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4632]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | 尚淑珍,邵建达,范正修. 低损耗193nm增透膜[J]. 物理学报,2008,57(3):1946, 1950. |
| APA | 尚淑珍,邵建达,&范正修.(2008).低损耗193nm增透膜.物理学报,57(3),1946. |
| MLA | 尚淑珍,et al."低损耗193nm增透膜".物理学报 57.3(2008):1946. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。