中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Temperature fields of 355 nm HR coatings based on the interface absorption model

文献类型:期刊论文

作者Zhan MQ(占美琼) ; Shao JD(邵建达)
刊名j. phys. d-appl. phys.
出版日期2008
卷号41期号:4页码:45306
关键词Damage mechanism Deposition temperatures Extinction coefficient High reflectance coating Interface absorption models
ISSN号0022-3727
中文摘要temperature fields of 355 nm high-reflectance (hr) coatings were investigated based on the interface absorption model. it was found that the highest temperature in the hr coatings increased with an increase in the extinction coefficient of the interface a, b, c, al2o3 and mgf2. the highest temperature of hr coatings that can be reached increased quickly with the increase in the extinction coefficient of interface a in particular. the temperature rises of 355 nm hr coatings at different layers and different deposition temperatures were investigated based on experiments also. the damage mechanism of 355 nm hr coatings was confirmed with temperature fields and the interface absorption model.
学科主题光学薄膜
收录类别EI
语种英语
WOS记录号WOS:000253177900027
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4682]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Zhan MQ,Shao JD. Temperature fields of 355 nm HR coatings based on the interface absorption model[J]. j. phys. d-appl. phys.,2008,41(4):45306.
APA 占美琼,&邵建达.(2008).Temperature fields of 355 nm HR coatings based on the interface absorption model.j. phys. d-appl. phys.,41(4),45306.
MLA 占美琼,et al."Temperature fields of 355 nm HR coatings based on the interface absorption model".j. phys. d-appl. phys. 41.4(2008):45306.

入库方式: OAI收割

来源:上海光学精密机械研究所

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