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Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

文献类型：期刊论文

作者Zhang Feng ; Zhu Huili ; Yang Weifeng ; Wu Zhengyun ; Qi Hongji ; He HB(贺洪波) ; Fan ZX(范正修) ; Shao JD(邵建达)
刊名appl. surf. sci.
出版日期2008
卷号254期号:10页码:3045
关键词UV antireflection coatings 4H-SiC Al2O3/SiO2 films electron-beam evaporation
ISSN号0169-4332
中文摘要al2o3/sio2 films have been deposited as uv antireflection coatings on 4h-sic by electron-beam evaporation and characterized by reflection spectrum, scanning electron microscopy (sem) and x-ray photoelectron spectroscopy (xps). the reflectance of the al2o3/sio2 films is 0.33% and 10 times lower than that of a thermally grown sio2 single layer at 276 nm. the films are amorphous in microstructure and characterize good adhesion to 4h-sic substrate. xps results indicate an abrupt interface between evaporated sio2 and 4h-sic substrate free of si-suboxides. these results make the possibility for 4h-sic based high performance uv optoelectronic devices with al2o3/sio2 films as antireflection coatings. (c) 2007 elsevier b.v. all rights reserved.
学科主题光学薄膜
收录类别EI
语种英语
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4686]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714		 Zhang Feng,Zhu Huili,Yang Weifeng,et al. Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC[J]. appl. surf. sci.,2008,254(10):3045, 3048.
APA Zhang Feng.,Zhu Huili.,Yang Weifeng.,Wu Zhengyun.,Qi Hongji.,...&邵建达.(2008).Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC.appl. surf. sci.,254(10),3045.
MLA Zhang Feng,et al."Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC".appl. surf. sci. 254.10(2008):3045.

入库方式： OAI收割

来源：上海光学精密机械研究所

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