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Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates

文献类型：期刊论文

作者Zhang Feng ; Yang Weifeng ; Pang Aisuo ; Wu Zhengyun ; Qi Hongji ; Yao JK(姚建可) ; Fan ZX(范正修) ; Shao JD(邵建达)
刊名appl. surf. sci.
出版日期2008
卷号254期号:20页码:6410
关键词annealing Al2O3/SiO2 films 4H-SiC external quantum efficiency
ISSN号0169-4332
中文摘要al2o3/sio2 films have been prepared by electron-beam evaporation as ultraviolet (uv) antireflection coatings on 4h-sic substrates and annealed at different temperatures. the films were characterized by reflection spectra, ellipsometer system, atomic force microscopy (afm), x-ray diffraction (xrd) and xray photoelectron spectroscopy (xps), respectively. as the annealing temperature increased, the minimum reflectance of the films moved to the shorter wavelength for the variation of refractive indices and the reduction of film thicknesses. the surface grains appeared to get larger in size and the root mean square (rms) roughness of the annealed films increased with the annealing temperature but was less than that of the as-deposited. the al2o3/sio2 films maintained amorphous in microstructure with the increase of the temperature. meanwhile, the transition and diffusion in film component were found in xps measurement. these results provided the important references for al2o3/sio2 films annealed at reasonable temperatures and prepared as fine anti-reflection coatings on 4h-sic-based uv optoelectronic devices. (c) 2008 elsevier b.v. all rights reserved.
学科主题光学薄膜
收录类别EI
语种英语
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4692]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714		 Zhang Feng,Yang Weifeng,Pang Aisuo,et al. Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates[J]. appl. surf. sci.,2008,254(20):6410, 6415.
APA Zhang Feng.,Yang Weifeng.,Pang Aisuo.,Wu Zhengyun.,Qi Hongji.,...&邵建达.(2008).Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates.appl. surf. sci.,254(20),6410.
MLA Zhang Feng,et al."Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates".appl. surf. sci. 254.20(2008):6410.

入库方式： OAI收割

来源：上海光学精密机械研究所

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