Mechanism initiated by nanoabsorber for UV nanosecond-pulse-driven damage of dielectric coatings
文献类型：期刊论文
| 作者 | Wei Chaoyang ; Shao JD(邵建达) ; He HB(贺洪波) ; Yi Kui ; Fan ZX(范正修) |
| 刊名 | opt. express
 |
| 出版日期 | 2008 |
| 卷号 | 16期号:5页码:3376 |
| 关键词 | Dielectric coatings Nanoabsorbers Nanosecond pulsed laser interactions Optical damage Plasma formation Temperature dependence |
| ISSN号 | 1094-4087 |
| 中文摘要 | a model of plasma formation induced by uv nanosecond pulselaser interaction with sio2 thin film based on nanoabsorber is proposed. the model considers the temperature dependence of band gap. the numerical results show that during the process of nanosecond pulsed-laser interaction with sio2 thin film, foreign inclusion which absorbs a fraction of incident radiation heats the surrounding host material through heat conduction causing the decrease of the band gap and consequently, the transformation of the initial transparent matrix into an absorptive medium around the inclusion, thus facilitates optical damage. qualitative comparison with experiments is also provided. (c) 2008 optical society of america. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000254121300061 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4726]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Wei Chaoyang,Shao JD,He HB,et al. Mechanism initiated by nanoabsorber for UV nanosecond-pulse-driven damage of dielectric coatings[J]. opt. express,2008,16(5):3376, 3382. |
| APA | Wei Chaoyang,邵建达,贺洪波,Yi Kui,&范正修.(2008).Mechanism initiated by nanoabsorber for UV nanosecond-pulse-driven damage of dielectric coatings.opt. express,16(5),3376. |
| MLA | Wei Chaoyang,et al."Mechanism initiated by nanoabsorber for UV nanosecond-pulse-driven damage of dielectric coatings".opt. express 16.5(2008):3376. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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