Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD
文献类型：期刊论文
| 作者 | Xiao Qi-Ling ; Shao SY(邵淑英) ; He HB(贺洪波) ; Shao JD(邵建达) ; Fan ZX(范正修) |
| 刊名 | chin. phys. lett.
 |
| 出版日期 | 2008 |
| 卷号 | 25期号:9页码:3433 |
| 关键词 | STABILIZED-ZIRCONIA TBCS DEPOSITION COATINGS ZRO2 |
| ISSN号 | 0256-307x |
| 中文摘要 | y2o3 stabilized zro2 (ysz) thin films with different y2o3 molar contents (0, 3, 7, and 12 mol%) are deposited on bk7 substrates by electron-beam evaporation technique. the effects of different y2o3 contents on residual stresses and structures of ysz thin films are studied. residual stresses are investigated by means of two different techniques: the curvature measurement and x- ray diffraction method. it is found that the evolution of residual stresses of ysz thin films by the two different methods is consistent. residual stresses of films transform from compressive stress into tensile stress and the tensile stress increases monotonically with the increase of y2o3 content. at the same time, the structures of these films change from the mixture of amorphous and monoclinic phases into high temperature cubic phase. the variations of residual stress correspond to the evolution of structures induced by adding of y2o3 content. |
| 学科主题 | 光学薄膜 |
| 资助信息 | national natural science foundation of china [10704078] |
| 语种 | 英语 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4730]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Xiao Qi-Ling,Shao SY,He HB,et al. Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD[J]. chin. phys. lett.,2008,25(9):3433, 3435. |
| APA | Xiao Qi-Ling,邵淑英,贺洪波,邵建达,&范正修.(2008).Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD.chin. phys. lett.,25(9),3433. |
| MLA | Xiao Qi-Ling,et al."Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD".chin. phys. lett. 25.9(2008):3433. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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