High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2 O5 films
文献类型：期刊论文
| 作者 | Xu Cheng ; Xiao Qiling ; Ma JY(麻健勇) ; Jin Yunxia ; Shao JD(邵建达) ; Fan ZX(范正修) |
| 刊名 | appl. surf. sci.
 |
| 出版日期 | 2008 |
| 卷号 | 254期号:20页码:6554 |
| 关键词 | Ta2O5 films annealing laser-induced damage threshold scattering absorption |
| ISSN号 | 0169-4332 |
| 中文摘要 | ta2o5 films were deposited by conventional electron beam evaporation method and then annealed in air at different temperature from 873 to 1273 k. it was found that the film structure changed from amorphous phase to hexagonal phase when annealed at 1073 k, then transformed to orthorhombic phase after annealed at 1273 k. the transmittance was improved after annealed at 873 k, and it decreased as the annealing temperature increased further. the total integrated scattering (tis) tests and afm results showed that both scattering and root mean square (rms) roughness of films increased with the annealing temperature increasing. x-ray photoelectron spectroscopy (xps) analysis showed that the film obtained better stoichiometry and the o/ta ratio increased to 2.50 after annealing. it was found that the laser-induced damage threshold (lidt) increased to the maximum when annealed at 873 k, while it decreased when the annealing temperature increased further. detailed damaged models dominated by different parameters during annealing were discussed. (c) 2008 elsevier b. v. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4736]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 |
Xu Cheng,Xiao Qiling,Ma JY,et al. High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta |
| APA |
Xu Cheng,Xiao Qiling,麻健勇,Jin Yunxia,邵建达,&范正修.(2008).High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta |
| MLA |
Xu Cheng,et al."High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta |
入库方式： OAI收割
来源：上海光学精密机械研究所
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