中国科学院机构知识库网格系统: 355nm增透膜的设计、制备与性能

中国科学院机构知识库网格

Chinese Academy of Sciences Institutional Repositories Grid

355nm增透膜的设计、制备与性能

文献类型：期刊论文


作者	余华 ; 崔云 ; 申雁鸣 ; 齐红基 ; 易葵 ; 邵建达 ; 范正修
刊名	中国激光
出版日期	2008
卷号	35 期号:12 页码:2026
关键词	薄膜增透膜热舟蒸发真空退火激光损伤阈值 355 nm lasers Damage morphologies Electric-field In vacuums Laser damage resistances Laser induce damage threshold Masking technologies Spectrum stabilities Substrate interfaces Surface conditions Thermal boat evaporation Vacuum annealing
ISSN号	0258-7025
其他题名	Design, preparation and characterization of 355 nm antireflection coatings
中文摘要	用热舟蒸发法结合修正挡板技术制备了355 nm LaF3/MgF2增透膜,并对部分样品进行了真空退火。采用Lambda 900光谱仪测试了增透膜的低反光谱和透射光谱,并考察了其光谱稳定性;使用脉冲8 ns的355 nm激光测试了增透膜的激光损伤阈值(LIDT);采用Normarski显微镜对增透膜的表面缺陷密度和破斑形貌进行了观察。实验结果表明,制备得到的增透膜的剩余反射率较低,光谱稳定性好;真空退火对增透膜的激光损伤阈值没有改善;增透膜的破环形貌为散点形式,结合破斑深度测试表明薄膜的破坏源于薄膜和基底界面的缺陷点。JGS1熔石英基底由于有好的表面状况、固有的高激光损伤阈值和以其为基底的增透膜具有更低的表面场强,使得其上的增透膜有更高的抗激光损伤能力。; 355 nm LaF3/MgF2 antireflection coatings were prepared by thermal boat evaporation combining masking technology. Some of these coatings were annealed in vacuum. The reflectance and transmittance spectra of the anti-reflective coatings were measured by a spectrophotometer Lambda 900. Meanwhile, the spectrum stability is tested. Laser induce damage threshold (LIDT) was performed by a 355 nm laser system with 8 ns pulses. The results show that the prepared anti-reflective coatings have very low reflectance and good spectrum stability. The vacuum annealing has no effect upon the LIDT. The damage morphologies are shown as dispersive spots. Moreover, the deep analysis shows that the damage origins from the defect at the film-substrate interfaces. The JGS1 substrate has better surface condition and higher laser damage resistance, and the antireflection coatings upon it has lower surface electric-field intensity. These advantages make the antireflection coatings on these substrates have higher LIDT.
学科主题	光学薄膜
收录类别	EI
语种	中文
公开日期	2009-09-22
源URL	[http://ir.siom.ac.cn/handle/181231/4750]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	余华,崔云,申雁鸣,等. 355nm增透膜的设计、制备与性能[J]. 中国激光,2008,35(12):2026, 2030.
APA	余华.,崔云.,申雁鸣.,齐红基.,易葵.,...&范正修.(2008).355nm增透膜的设计、制备与性能.中国激光,35(12),2026.
MLA	余华,et al."355nm增透膜的设计、制备与性能".中国激光 35.12(2008):2026.

入库方式： OAI收割

来源：上海光学精密机械研究所

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