HfO2的纯度对紫外多层膜反射率的影响
文献类型：期刊论文
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| 作者 | 袁景梅 ; 齐红基 ; 赵元安 ; 范正修 ; 邵建达 |
| 刊名 | Chin. Opt. Lett.
 |
| 出版日期 | 2008 |
| 卷号 | 6期号:3页码:222 |
| 关键词 | 光学薄膜 Glow discharge mass spectrum 紫外膜 Ultraviolet multilayer ZrO2 HfO2 光学性能 |
| ISSN号 | 1671-7694 |
| 其他题名 | Influence of purity of HfO2 on reflectance of ultraviolet multilayer |
| 中文摘要 | 用辉光放电质谱法和二次离子质谱仪测定了两种HfO2材料及它们相应的单层膜中的杂质含量，结果发现，无论是在体材料中还是在用电子束蒸发技术沉积的材料单层薄膜中，ZrO2都是这两种HfO2材料中最主要的杂质。而且，这两种HfO2材料中Zr含量的差别远远大于Ti、Fe含量的差别，这说明Zr含量的差别正是引起两种HfO2膜层光学性能差别的原因。用这两种不同纯度的HfO2材料与同一纯度的SiO2材料组合，沉积形成266nm的紫外反射镜，实验结果表明这两种反射镜的反射率分别在99.85% 和 99.15%左右。这个结果与依据单层膜得出的光学常数所设计的结果符合的很好。; The impurities in two kinds of HfO2 materials and in their corresponding single layer thin films were determined through glow discharge mass spectrum technology and secondary ion mass spectrometry (SIMS) equipment respectively. It was found that ZrO2 was the main impurity in the two kinds of HfO2 either in the original HfO2 materials or in the electron beam deposited films. In addition, the difference of Zr content in the two kinds of HfO2 single layer films was much larger than that of the other impurities such as Ti and Fe, which showed that it was just ZrO2 that made the difference between the optical performance of the film products including the two kinds of HfO2. With these two kinds of HfO2 and the same kind of SiO2, we deposited HfO2/SiO2 multilayer reflective coatings at the wavelength of 266 nm. Experimental results showed that the reflectances of these two mirrors were about 99.85% and 99.15% respectively, which agreed well with the designed results what were based on the optical constants obtained from the corresponding single layer thin films. |
| 学科主题 | 光学薄膜 |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4754]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | 袁景梅,齐红基,赵元安,等. HfO2的纯度对紫外多层膜反射率的影响, Influence of purity of HfO2 on reflectance of ultraviolet multilayer[J]. Chin. Opt. Lett.,2008,6(3):222, 224. |
| APA | 袁景梅,齐红基,赵元安,范正修,&邵建达.(2008).HfO2的纯度对紫外多层膜反射率的影响.Chin. Opt. Lett.,6(3),222. |
| MLA | 袁景梅,et al."HfO2的纯度对紫外多层膜反射率的影响".Chin. Opt. Lett. 6.3(2008):222. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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