Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication
文献类型:期刊论文
作者 | Wang Qi ; Zhang Dawei ; He HB(贺洪波) ; Huang Yuanshen ; Chen JiaBi ; Chen Lin ; Zhu Yiming ; Zhuang Songlin |
刊名 | opt. lett.
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出版日期 | 2009 |
卷号 | 34期号:1页码:70 |
关键词 | OPTICAL FILTERS GRATING FILTERS BAND |
ISSN号 | 0146-9592 |
中文摘要 | unless the fabrication error control is well treated, it easily causes overetched fabrication errors, which causes the resonant peak value deviation during the fabrication process of guided-mode resonant filters (gmrfs). hence, the fabrication error control becomes a key point for improving the performance of gmrf. we find that, within the range of the groove depth from 93 to 105 nm, the relationship between the overetched error and the resonant peak value deviation is nearly linear, which means that we can compensate the reflectance response deviation and reduce the resonant peak value deviation by the method of covering the layer film on the gmrf. simulation results show that the deviation is compensated perfectly by this way. (c) 2008 optical society of america |
学科主题 | 光学薄膜 |
资助信息 | national basic research program of china [2007cb935303, 2005cb724304]; shanghai committee of science technology [06dz22016, 07dz22026, 08530707400, 08zr1415400] |
语种 | 英语 |
WOS记录号 | WOS:000262889300024 |
公开日期 | 2009-09-22 |
源URL | [http://ir.siom.ac.cn/handle/181231/4766] ![]() |
专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
推荐引用方式 GB/T 7714 | Wang Qi,Zhang Dawei,He HB,et al. Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication[J]. opt. lett.,2009,34(1):70, 72. |
APA | Wang Qi.,Zhang Dawei.,贺洪波.,Huang Yuanshen.,Chen JiaBi.,...&Zhuang Songlin.(2009).Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication.opt. lett.,34(1),70. |
MLA | Wang Qi,et al."Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication".opt. lett. 34.1(2009):70. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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