中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication

文献类型:期刊论文

作者Wang Qi ; Zhang Dawei ; He HB(贺洪波) ; Huang Yuanshen ; Chen JiaBi ; Chen Lin ; Zhu Yiming ; Zhuang Songlin
刊名opt. lett.
出版日期2009
卷号34期号:1页码:70
关键词OPTICAL FILTERS GRATING FILTERS BAND
ISSN号0146-9592
中文摘要unless the fabrication error control is well treated, it easily causes overetched fabrication errors, which causes the resonant peak value deviation during the fabrication process of guided-mode resonant filters (gmrfs). hence, the fabrication error control becomes a key point for improving the performance of gmrf. we find that, within the range of the groove depth from 93 to 105 nm, the relationship between the overetched error and the resonant peak value deviation is nearly linear, which means that we can compensate the reflectance response deviation and reduce the resonant peak value deviation by the method of covering the layer film on the gmrf. simulation results show that the deviation is compensated perfectly by this way. (c) 2008 optical society of america
学科主题光学薄膜
资助信息national basic research program of china [2007cb935303, 2005cb724304]; shanghai committee of science technology [06dz22016, 07dz22026, 08530707400, 08zr1415400]
语种英语
WOS记录号WOS:000262889300024
公开日期2009-09-22
源URL[http://ir.siom.ac.cn/handle/181231/4766]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Wang Qi,Zhang Dawei,He HB,et al. Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication[J]. opt. lett.,2009,34(1):70, 72.
APA Wang Qi.,Zhang Dawei.,贺洪波.,Huang Yuanshen.,Chen JiaBi.,...&Zhuang Songlin.(2009).Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication.opt. lett.,34(1),70.
MLA Wang Qi,et al."Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication".opt. lett. 34.1(2009):70.

入库方式: OAI收割

来源:上海光学精密机械研究所

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