Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films
文献类型：期刊论文
| 作者 | Xu Cheng ; Dong Hongcheng ; Yuan Lei ; He HB(贺洪波) ; Shao JD(邵建达) ; Fan ZX(范正修) |
| 刊名 | opt. laser technol.
 |
| 出版日期 | 2009 |
| 卷号 | 41期号:3页码:258 |
| 关键词 | Annealing Ta2O5 films Laser-induced damage threshold |
| ISSN号 | 0030-3992 |
| 中文摘要 | ta2o5 films were deposited using the conventional electron beam evaporation method and then annealed at temperatures in the range 373-673 k. chemical composition, scattering and absorption were examined by x-ray photoelectron spectroscopy (xps), total integrated scattering (tis) measurement and the surface thermal lensing (m) technique, respectively. the laser-induced damage threshold (lidt) was assessed using the output from an nd:yag laser with a pulse length of 12 ns. the results showed that the improvement of the lidt after annealing was due to the reduced substoichiometric and structural defects present in the film. the lidt increased slightly below 573k and then increased significantly with increase in annealing temperature, which could be attributed to different dominant defects. moreover, the root mean square (rms) roughness and scattering had little effect on the lidt, while the absorption and the lidt were in accord with a general relation. (c) 2008 elsevier ltd. all rights reserved. |
| 学科主题 | 光学薄膜 |
| 资助信息 | chinese national natural science foundation [60608020] |
| 语种 | 英语 |
| WOS记录号 | WOS:000262206200008 |
| 公开日期 | 2009-09-22 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/4774]  |
| 专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
| 推荐引用方式 GB/T 7714 | Xu Cheng,Dong Hongcheng,Yuan Lei,et al. Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films[J]. opt. laser technol.,2009,41(3):258, 263. |
| APA | Xu Cheng,Dong Hongcheng,Yuan Lei,贺洪波,邵建达,&范正修.(2009).Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films.opt. laser technol.,41(3),258. |
| MLA | Xu Cheng,et al."Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films".opt. laser technol. 41.3(2009):258. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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