中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation:Optical properties, structure and residual stresses

文献类型:期刊论文

作者Xiao QL(肖祁陵) ; Xu C(许程) ; Shao SY(邵淑英) ; Shao JD(邵建达) ; Fan ZX(范正修)
刊名vacuum
出版日期2009
期号83页码:366-371
关键词YSZ thin films Residual stress Electron-beam evaporation Refractive index Structural properties
合作状况其它
收录类别其他
语种中文
公开日期2010-05-06
源URL[http://ir.siom.ac.cn/handle/181231/6713]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
Xiao QL,Xu C,Shao SY,et al. Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation:Optical properties, structure and residual stresses[J]. vacuum,2009(83):366-371.
APA Xiao QL,Xu C,Shao SY,Shao JD,&Fan ZX.(2009).Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation:Optical properties, structure and residual stresses.vacuum(83),366-371.
MLA Xiao QL,et al."Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation:Optical properties, structure and residual stresses".vacuum .83(2009):366-371.

入库方式: OAI收割

来源:上海光学精密机械研究所

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