Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image
文献类型：期刊论文
| 作者 | Peng B(彭勃) ; Wang XZ(王向朝) ; Qiu ZC(邱自成) ; Cao YT(曹宇婷) ; Duan LF(段立峰) |
| 刊名 | applied optics
 |
| 出版日期 | 2010 |
| 卷号 | 49期号:15页码:2753-2760 |
| 合作状况 | 其它 |
| 学科主题 | 光学 |
| 收录类别 | 其他 |
| 语种 | 中文 |
| 公开日期 | 2011-03-31 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/7083]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 推荐引用方式 GB/T 7714 | Peng B,Wang XZ,Qiu ZC,et al. Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image[J]. applied optics,2010,49(15):2753-2760. |
| APA | Peng B,Wang XZ,Qiu ZC,Cao YT,&Duan LF.(2010).Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image.applied optics,49(15),2753-2760. |
| MLA | Peng B,et al."Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image".applied optics 49.15(2010):2753-2760. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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