Chemisorption and reaction characteristics of methyl radicals on Cu(110)
文献类型：期刊论文
| 作者 | Zhai, RS; Chan, YL; Chuang, P; Hsu, CK; Mukherjee, M; Chuang, TJ; Klauser, R |
| 刊名 | langmuir
 |
| 出版日期 | 2004-04-27 |
| 卷号 | 20期号:9页码:3623-3631 |
| 产权排序 | 2;1 |
| 英文摘要 | methyl radicals are generated by pyrolysis of azomethane, and the condition for achieving neat adsorption on cu(110) is described for studying their chemisorption and reaction characteristics. the radical-surface system is examined by x-ray photoemission spectroscopy, ultraviolet photoemission spectroscopy, temperature-programmed desorption, low-energy electron diffraction (leed), and high-resolution electron energy loss spectroscopy under ultrahigh vacuum conditions. it is observed that a small fraction of impinging ch3 radicals decompose into methylene possibly on surface defect sites. this type of ch2 radical has no apparent effect on ch3(ads) surface chemistry initiated by dehydrogenation to form active ch2(ads) followed by chain reactions to yield high-mass alkyl products. all thermal desorption products, such as h-2, ch4, c2h4, c2h6, and c3h6, are detected with a single desorption peak near 475 k. the product yields increase with surface coverage until saturation corresponding to 0.50 monolayer of ch3(ads). the mass distribution is, however, invariant with initial ch3(ads) coverage, and all desorbed species exhibit first-order reaction kinetics. leed measurement reveals a c(2 x 2) adsorbate structure independent of the amount of gaseous exposure. this strongly suggests that the radicals aggregate into close-packed two-dimensional islands at any exposure. the islanding behavior can be correlated with the reaction kinetics and is deemed to be essential for the chain propagation reactions. some relevant aspects of the ch3/cu(111) system are also presented. the new results are compared with those of prior studies employing methyl halides as radical sources. major differences are found in the product distribution and desorption kinetics, and these are attributed to the influence of surface halogen atoms present in those earlier investigations. |
| WOS标题词 | science & technology ; physical sciences ; technology |
| 类目[WOS] | chemistry, multidisciplinary ; chemistry, physical ; materials science, multidisciplinary |
| 研究领域[WOS] | chemistry ; materials science |
| 关键词[WOS] | alkyl halide photochemistry ; energy-loss spectroscopy ; surface-chemistry ; chain propagation ; thermal-decomposition ; adsorption geometry ; coadsorbed iodine ; bond formation ; ch3 ; oxygen |
| 收录类别 | SCI |
| 原文出处 | true |
| 语种 | 英语 |
| WOS记录号 | WOS:000221022400025 |
| 公开日期 | 2010-11-30 |
| 源URL | [http://159.226.238.44/handle/321008/81741]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 作者单位 | 1.Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 116023, Taiwan 2.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China 3.Saha Inst Nucl Phys, Surface Phys Div, Kolkata 700064, W Bengal, India 4.Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan |
| 推荐引用方式 GB/T 7714 | Zhai, RS,Chan, YL,Chuang, P,et al. Chemisorption and reaction characteristics of methyl radicals on Cu(110)[J]. langmuir,2004,20(9):3623-3631. |
| APA | Zhai, RS.,Chan, YL.,Chuang, P.,Hsu, CK.,Mukherjee, M.,...&Klauser, R.(2004).Chemisorption and reaction characteristics of methyl radicals on Cu(110).langmuir,20(9),3623-3631. |
| MLA | Zhai, RS,et al."Chemisorption and reaction characteristics of methyl radicals on Cu(110)".langmuir 20.9(2004):3623-3631. |
入库方式： OAI收割
来源：大连化学物理研究所
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