中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effects of superimposed pulse bias on TiN coating in cathodic arc deposition

文献类型:期刊论文

作者Li ZY(李正阳); Zhu WB(朱武飚); Zhang Y(张勇); Li GY(李桂英); Cao EY(曹尔妍)
刊名Surface & Coatings Technology
出版日期2000
卷号131期号:1-3页码:158-161
ISSN号0257-8972
通讯作者Li, ZY (reprint author), Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China.
中文摘要Orthogonal designs are used to investigate the main factors when doing experiments in which pulse bias is superimposed on d.c. bias during cathodic are deposition of TiN. Pulse peak, duty cycle, frequency, direct voltage, are current and pressure all are investigated when coating TiN on HSS substrates. Roughness, surface micrograph, microhardness and thickness are tested. By analysis of variance, it is shown that pressure and frequency are the main factors. R-a and droplet density of the film with (d.c. + pulse) bias decrease. A simple explanation for the result is suggested.
学科主题力学
类目[WOS]Materials Science, Coatings & Films ; Physics, Applied
研究领域[WOS]Materials Science ; Physics
收录类别SCI
语种英语
WOS记录号WOS:000165548200032
公开日期2007-06-15
源URL[http://dspace.imech.ac.cn/handle/311007/16804]  
专题力学研究所_力学所知识产出(1956-2008)
推荐引用方式
GB/T 7714
Li ZY,Zhu WB,Zhang Y,et al. Effects of superimposed pulse bias on TiN coating in cathodic arc deposition[J]. Surface & Coatings Technology,2000,131(1-3):158-161.
APA 李正阳,朱武飚,张勇,李桂英,&曹尔妍.(2000).Effects of superimposed pulse bias on TiN coating in cathodic arc deposition.Surface & Coatings Technology,131(1-3),158-161.
MLA 李正阳,et al."Effects of superimposed pulse bias on TiN coating in cathodic arc deposition".Surface & Coatings Technology 131.1-3(2000):158-161.

入库方式: OAI收割

来源:力学研究所

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