中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Halogen bonding and hydrogen bonding coexist in driving self-assembly process

文献类型:期刊论文

作者Zhu SZ(朱仕正) ; Xing CH(邢春晖) ; Xu W(许伟) ; Jin GF(金桂芳) ; Li ZT(黎占亭)
刊名Cryst. Growth Des.
出版日期2004
卷号4期号:1页码:53-56
ISSN号1528-7483
其他题名卤键与氢键共存驱动的自组装过程
通讯作者朱仕正 ; 黎占亭
英文摘要A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N',N'-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule.
学科主题有机氟化学
收录类别SCI
原文出处http://dx.doi.org/10.1021/cg0300275
语种英语
WOS记录号WOS:000187968300013
公开日期2013-01-18
源URL[http://202.127.28.38/handle/331003/14332]  
专题上海有机化学研究所_中科院有机氟化学重点实验室
推荐引用方式
GB/T 7714
Zhu SZ,Xing CH,Xu W,et al. Halogen bonding and hydrogen bonding coexist in driving self-assembly process[J]. Cryst. Growth Des.,2004,4(1):53-56.
APA 朱仕正,邢春晖,许伟,金桂芳,&黎占亭.(2004).Halogen bonding and hydrogen bonding coexist in driving self-assembly process.Cryst. Growth Des.,4(1),53-56.
MLA 朱仕正,et al."Halogen bonding and hydrogen bonding coexist in driving self-assembly process".Cryst. Growth Des. 4.1(2004):53-56.

入库方式: OAI收割

来源:上海有机化学研究所

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