Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold
文献类型:期刊论文
作者 | Wang Z ; Yu XH ; Xing RB ; Han YC ; Takahara A |
刊名 | journal of vacuum science & technology b
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出版日期 | 2009 |
卷号 | 27期号:4页码:1958-1962 |
关键词 | THIN-FILM TRANSISTORS LIGHT-EMITTING-DIODES PRINTING TECHNIQUES FABRICATION |
ISSN号 | 1071-1023 |
通讯作者 | wang z |
中文摘要 | a simple and efficient method for patterning polymeric semiconductors for applications in the field of organic electronics is proposed. the entire polymer layer, except for the desired pattern, is selectively lifted off from a flat poly(dimethylsiloxane) (pdms) stamp surface by an epoxy mold with a relief pattern. this is advantageous because the elastic deformation of the pdms stamp around protrusions of a patterned stamp under pressure can assist the plastic deformation of a polymer film along the pattern edges, yielding large area and high quality patterns, and the pdms surface has low surface energy, which allows the easy removal of the polymer film. |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000268535600034 |
公开日期 | 2010-05-27 |
源URL | [http://202.98.16.49/handle/322003/12117] ![]() |
专题 | 长春应用化学研究所_长春应用化学研究所知识产出_期刊论文 |
推荐引用方式 GB/T 7714 | Wang Z,Yu XH,Xing RB,et al. Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold[J]. journal of vacuum science & technology b,2009,27(4):1958-1962. |
APA | Wang Z,Yu XH,Xing RB,Han YC,&Takahara A.(2009).Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold.journal of vacuum science & technology b,27(4),1958-1962. |
MLA | Wang Z,et al."Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold".journal of vacuum science & technology b 27.4(2009):1958-1962. |
入库方式: OAI收割
来源:长春应用化学研究所
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