中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold

文献类型:期刊论文

作者Wang Z ; Yu XH ; Xing RB ; Han YC ; Takahara A
刊名journal of vacuum science & technology b
出版日期2009
卷号27期号:4页码:1958-1962
关键词THIN-FILM TRANSISTORS LIGHT-EMITTING-DIODES PRINTING TECHNIQUES FABRICATION
ISSN号1071-1023
通讯作者wang z
中文摘要a simple and efficient method for patterning polymeric semiconductors for applications in the field of organic electronics is proposed. the entire polymer layer, except for the desired pattern, is selectively lifted off from a flat poly(dimethylsiloxane) (pdms) stamp surface by an epoxy mold with a relief pattern. this is advantageous because the elastic deformation of the pdms stamp around protrusions of a patterned stamp under pressure can assist the plastic deformation of a polymer film along the pattern edges, yielding large area and high quality patterns, and the pdms surface has low surface energy, which allows the easy removal of the polymer film.
收录类别SCI
语种英语
WOS记录号WOS:000268535600034
公开日期2010-05-27
源URL[http://202.98.16.49/handle/322003/12117]  
专题长春应用化学研究所_长春应用化学研究所知识产出_期刊论文
推荐引用方式
GB/T 7714
Wang Z,Yu XH,Xing RB,et al. Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold[J]. journal of vacuum science & technology b,2009,27(4):1958-1962.
APA Wang Z,Yu XH,Xing RB,Han YC,&Takahara A.(2009).Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold.journal of vacuum science & technology b,27(4),1958-1962.
MLA Wang Z,et al."Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold".journal of vacuum science & technology b 27.4(2009):1958-1962.

入库方式: OAI收割

来源:长春应用化学研究所

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