Design of control system for high-power TEA CO2laser
文献类型：期刊论文
| 作者 | Yu, D.; L. Guo; F. Chen; F. Meng; G. Yang and M. Shao |
| 刊名 | Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering
 |
| 出版日期 | 2016 |
| 卷号 | 45期号:7 |
| 英文摘要 | To meet the wide angular bandpass requirement of a small-size mirror in extreme ultra violet (EUV) lithography illumination system, the designed broadband molybdenum (Mo)/silicon (Si) multilayer stack is deposited by using the relationship between effective thickness of Si layers and velocity and the relationship between periodic thickness of multilayers and velocity. Mo/Si periodic multilayers with different periodic thicknesses and G (ratio of Mo layer thickness and periodic thickness of multilayer films) are deposited by magnetron sputtering and characterized by small-angle X-ray reflectometry. The relationship between periodic thickness of multilayers and velocity, the relationship between effective thickness of Mo and Si layers and velocity, and the interface roughness of multilayers are provided by characterization of X-ray reflection spectrum. The broadband multilayer stack is designed by utilizing the Levenberg-Marquardt algorithm, and the designed EUV reflectance is R=42%1% at the range of 16.8~24.8. The designed stack is deposited according to the relationship between effective thickness of Si layers and velocity and the relationship between periodic thickness of multilayers and velocity. The measured EUV reflectance of the broadband Mo/Si multilayer stack is 41.2%~43.0% at the range of 16.8~24.8, which is very close to the designed value. Further fabrication error reversion indicates that the small difference between the experimental and designed results is mainly caused by the systematic error in the calibration of value and interface roughness of Mo/Si multilayers. 2016, Chinese Lasers Press. All right reserved. |
| 收录类别 | EI |
| 语种 | 中文 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/57375]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Yu, D.,L. Guo,F. Chen,et al. Design of control system for high-power TEA CO2laser[J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,2016,45(7). |
| APA | Yu, D.,L. Guo,F. Chen,F. Meng,&G. Yang and M. Shao.(2016).Design of control system for high-power TEA CO2laser.Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,45(7). |
| MLA | Yu, D.,et al."Design of control system for high-power TEA CO2laser".Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering 45.7(2016). |
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