中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Dewetting of thin polystyrene films under confinement

文献类型:期刊论文

作者Peng J ; Xing RB ; Wu Y ; Li BY ; Han YC ; Knoll W ; Kim DH
刊名langmuir
出版日期2007
卷号23期号:5页码:2326-2329
关键词POLYMER-FILMS LIQUID-FILMS PATTERN-FORMATION INSTABILITIES NUCLEATION DYNAMICS GRADIENT RUPTURE ARRAYS
ISSN号0743-7463
通讯作者han yc
中文摘要the dewetting behavior of thin polystyrene (ps) film has been investigated by placing an upper plate with a ca. 140 nm gap from the underlying substrate with the spin-coated thin polymer films. three different kinds of dewetting behaviors of thin ps film have been observed after annealing according to the relative position of the ps film to the upper plate. since the upper plate is smaller than the underlying substrate, a part of the polymer film is not covered by the plate. in this region (i), thin ps film dewetting occurs in a conventional manner, as previously reported. while in the region covered by the upper plate (iii), the ps film exhibits unusual dewetted patterns. meanwhile, in the area right under the edge of the plate (ii) (i.e., the area between region i and region iii), highly ordered arrays of ps droplets are formed. formation mechanisms of different dewetted patterns are discussed in detail. this study may offer an effective way to improve the understanding of various dewetting behaviors and facilitate the ongoing exploration of utilizing dewetting as a patterning technique.
收录类别SCI
语种英语
WOS记录号WOS:000244248700016
公开日期2010-07-13
源URL[http://ir.ciac.jl.cn/handle/322003/14277]  
专题长春应用化学研究所_长春应用化学研究所知识产出_期刊论文
推荐引用方式
GB/T 7714
Peng J,Xing RB,Wu Y,et al. Dewetting of thin polystyrene films under confinement[J]. langmuir,2007,23(5):2326-2329.
APA Peng J.,Xing RB.,Wu Y.,Li BY.,Han YC.,...&Kim DH.(2007).Dewetting of thin polystyrene films under confinement.langmuir,23(5),2326-2329.
MLA Peng J,et al."Dewetting of thin polystyrene films under confinement".langmuir 23.5(2007):2326-2329.

入库方式: OAI收割

来源:长春应用化学研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。