Ordered pattern formation from dewetting of polymer thin film with surface disturbance by capillary force lithography
文献类型：期刊论文
| 作者 | Luo CX ; Xing RB ; Han YC |
| 刊名 | surface science
 |
| 出版日期 | 2004 |
| 卷号 | 552期号:1-3页码:139-148 |
| 关键词 | NANOINDENTATION-INDUCED DEFECTS LIQUID-FILMS SELF-ORGANIZATION HETEROGENEOUS SURFACES INSTABILITY TRANSITIONS DYNAMICS |
| ISSN号 | 0039-6028 |
| 通讯作者 | han yc |
| 中文摘要 | the dewetting process of thin polystyrene (ps) film with built-in ordered disturbance by capillary force lithography (cfl) has. been investigated in situ by afm. two different phenomena are observed depending on the excess surface energy (deltaf(gamma)) of the system. when deltaf(gamma) is less than a certain critical value (i.e., the disturbance amplitude is under a critical value), the ps film would be flattened and become stable finally by heating above t-g. while, if the size of the disturbance amplitude is larger than the critical value, ordered ps liquid droplets form by further dewetting. the pattern formation mechanisms and influencing factors have been discussed in detail. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000220123000018 |
| 公开日期 | 2010-08-17 |
| 源URL | [http://202.98.16.49/handle/322003/15227]  |
| 专题 | 长春应用化学研究所_长春应用化学研究所知识产出_期刊论文 |
| 推荐引用方式 GB/T 7714 | Luo CX,Xing RB,Han YC. Ordered pattern formation from dewetting of polymer thin film with surface disturbance by capillary force lithography[J]. surface science,2004,552(1-3):139-148. |
| APA | Luo CX,Xing RB,&Han YC.(2004).Ordered pattern formation from dewetting of polymer thin film with surface disturbance by capillary force lithography.surface science,552(1-3),139-148. |
| MLA | Luo CX,et al."Ordered pattern formation from dewetting of polymer thin film with surface disturbance by capillary force lithography".surface science 552.1-3(2004):139-148. |
入库方式： OAI收割
来源：长春应用化学研究所
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