Morphologies in solvent-annealed thin films of symmetric diblock copolymer
文献类型：期刊论文
| 作者 | Peng J ; Kim DH ; Knoll W ; Xuan Y ; Li BY ; Han YC |
| 刊名 | journal of chemical physics
 |
| 出版日期 | 2006 |
| 卷号 | 125期号:6页码:文献编号：064702 |
| 关键词 | BLOCK-COPOLYMER TRIBLOCK COPOLYMER PHASE-BEHAVIOR MICROPHASE SEPARATION NEUTRON REFLECTIVITY SELECTIVE SOLVENT VAPOR TREATMENT NANOPATTERNS ELASTOMERS SCATTERING |
| ISSN号 | 0021-9606 |
| 通讯作者 | han yc |
| 中文摘要 | we have systematically studied the thin film morphologies of symmetric poly(styrene)-block-poly(methyl methacrylate) (ps-b-pmma) diblock copolymer after annealing to solvents with varying selectivity. upon neutral solvent vapor annealing, terraced morphology is observed without any lateral structures on the surfaces. when using ps-selective solvent annealing, the film exhibits macroscopically flat with a disordered micellar structure. while pmma-selective solvent annealing leads to the dewetting of the film with fractal-like holes, with highly ordered nanoscale depressions in the region of undewetted films. in addition, when decreasing the swelling degree of the film in the case of pmma-selective solvent annealing, hills and valleys are observed with the coexistence of highly ordered nanoscale spheres and stripes on the surface, in contrast to the case of higher swelling degree. the differences are explained qualitatively on the basis of polymer-solvent interaction parameters of the different components. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000239765100036 |
| 公开日期 | 2010-08-17 |
| 源URL | [http://ir.ciac.jl.cn/handle/322003/16109]  |
| 专题 | 长春应用化学研究所_长春应用化学研究所知识产出_期刊论文 |
| 推荐引用方式 GB/T 7714 | Peng J,Kim DH,Knoll W,et al. Morphologies in solvent-annealed thin films of symmetric diblock copolymer[J]. journal of chemical physics,2006,125(6):文献编号：064702. |
| APA | Peng J,Kim DH,Knoll W,Xuan Y,Li BY,&Han YC.(2006).Morphologies in solvent-annealed thin films of symmetric diblock copolymer.journal of chemical physics,125(6),文献编号：064702. |
| MLA | Peng J,et al."Morphologies in solvent-annealed thin films of symmetric diblock copolymer".journal of chemical physics 125.6(2006):文献编号：064702. |
入库方式： OAI收割
来源：长春应用化学研究所
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