STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite
文献类型:期刊论文
作者 | Zhang BL ; Wang EK |
刊名 | chinese journal of chemistry
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出版日期 | 1995 |
卷号 | 13期号:6页码:493-496 |
关键词 | SCANNING-TUNNELING-MICROSCOPY SODIUM DECATUNGSTOCERATE IV |
ISSN号 | 1001-604x |
中文摘要 | molecular layer of tungstosilicic acid (h4siw12o40) deposited on freshly-cleaved highly oriented pyrolytic graphite (hopg) was observed by scanning tunneling microscopy (stm) in air at room temperature. the molecular dimension (11.5 angstrom) of h4siw12o40 measured by stm is consistent with known crystallographic parameter. we also imaged the boundary of h4siw12o40 molecular layer on hopg showing that molecular layer of h4siw12o40 was formed. it has been proved that individual tungstosilicic acid species is imaged. the probable reason for the formation of the molecular layer is also discussed. |
收录类别 | SCI收录期刊论文 |
语种 | 英语 |
公开日期 | 2010-12-30 ; 2011-06-10 |
源URL | [http://ir.ciac.jl.cn/handle/322003/26335] ![]() |
专题 | 长春应用化学研究所_长春应用化学研究所知识产出_期刊论文 |
推荐引用方式 GB/T 7714 | Zhang BL,Wang EK. STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite[J]. chinese journal of chemistry,1995,13(6):493-496. |
APA | Zhang BL,&Wang EK.(1995).STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite.chinese journal of chemistry,13(6),493-496. |
MLA | Zhang BL,et al."STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite".chinese journal of chemistry 13.6(1995):493-496. |
入库方式: OAI收割
来源:长春应用化学研究所
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