中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite

文献类型:期刊论文

作者Zhang BL ; Wang EK
刊名chinese journal of chemistry
出版日期1995
卷号13期号:6页码:493-496
关键词SCANNING-TUNNELING-MICROSCOPY SODIUM DECATUNGSTOCERATE IV
ISSN号1001-604x
中文摘要molecular layer of tungstosilicic acid (h4siw12o40) deposited on freshly-cleaved highly oriented pyrolytic graphite (hopg) was observed by scanning tunneling microscopy (stm) in air at room temperature. the molecular dimension (11.5 angstrom) of h4siw12o40 measured by stm is consistent with known crystallographic parameter. we also imaged the boundary of h4siw12o40 molecular layer on hopg showing that molecular layer of h4siw12o40 was formed. it has been proved that individual tungstosilicic acid species is imaged. the probable reason for the formation of the molecular layer is also discussed.
收录类别SCI收录期刊论文
语种英语
公开日期2010-12-30 ; 2011-06-10
源URL[http://ir.ciac.jl.cn/handle/322003/26335]  
专题长春应用化学研究所_长春应用化学研究所知识产出_期刊论文
推荐引用方式
GB/T 7714
Zhang BL,Wang EK. STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite[J]. chinese journal of chemistry,1995,13(6):493-496.
APA Zhang BL,&Wang EK.(1995).STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite.chinese journal of chemistry,13(6),493-496.
MLA Zhang BL,et al."STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite".chinese journal of chemistry 13.6(1995):493-496.

入库方式: OAI收割

来源:长春应用化学研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。