Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime
文献类型:期刊论文
作者 | Zhang, Kui; Chen, Zhimin; Geng, Yongyou; Wang, Yang; Wu, Yiqun |
刊名 | Chin. Opt. Lett.
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出版日期 | 2016 |
卷号 | 14期号:5 |
通讯作者 | yqwu@siom.ac.cn |
英文摘要 | Metal hydrazone complex thin films are used as laser patterning materials, and the patterns with a minimum resolution of about 78 nm are successfully obtained by the laser writing setup (lambda = 405 nm, NA = 0.9). The minimum resolution is only about 1/8 of the writing spot size. In the formation of patterns, there is only a single step for forming patterns by the laser heating-induced clear thermal gasification threshold effect without any other development processes such as wet etching. This work provides an effective method for directly achieving nanoscale-resolved pattern structures with diode-based maskless laser writing lithography at visible light wavelengths. |
收录类别 | SCI |
资助信息 | National Natural Science Foundation of China [61137002, 61178059, 51172253] |
WOS记录号 | WOS:000375921000011 |
源URL | [http://ir.siom.ac.cn/handle/181231/28244] ![]() |
专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
作者单位 | 中国科学院上海光学精密机械研究所 |
推荐引用方式 GB/T 7714 | Zhang, Kui,Chen, Zhimin,Geng, Yongyou,et al. Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime[J]. Chin. Opt. Lett.,2016,14(5). |
APA | Zhang, Kui,Chen, Zhimin,Geng, Yongyou,Wang, Yang,&Wu, Yiqun.(2016).Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime.Chin. Opt. Lett.,14(5). |
MLA | Zhang, Kui,et al."Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime".Chin. Opt. Lett. 14.5(2016). |
入库方式: OAI收割
来源:上海光学精密机械研究所
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