中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime

文献类型:期刊论文

作者Zhang, Kui; Chen, Zhimin; Geng, Yongyou; Wang, Yang; Wu, Yiqun
刊名Chin. Opt. Lett.
出版日期2016
卷号14期号:5
通讯作者yqwu@siom.ac.cn
英文摘要Metal hydrazone complex thin films are used as laser patterning materials, and the patterns with a minimum resolution of about 78 nm are successfully obtained by the laser writing setup (lambda = 405 nm, NA = 0.9). The minimum resolution is only about 1/8 of the writing spot size. In the formation of patterns, there is only a single step for forming patterns by the laser heating-induced clear thermal gasification threshold effect without any other development processes such as wet etching. This work provides an effective method for directly achieving nanoscale-resolved pattern structures with diode-based maskless laser writing lithography at visible light wavelengths.
收录类别SCI
资助信息National Natural Science Foundation of China [61137002, 61178059, 51172253]
WOS记录号WOS:000375921000011
源URL[http://ir.siom.ac.cn/handle/181231/28244]  
专题上海光学精密机械研究所_高密度光存储技术实验室
作者单位中国科学院上海光学精密机械研究所
推荐引用方式
GB/T 7714
Zhang, Kui,Chen, Zhimin,Geng, Yongyou,et al. Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime[J]. Chin. Opt. Lett.,2016,14(5).
APA Zhang, Kui,Chen, Zhimin,Geng, Yongyou,Wang, Yang,&Wu, Yiqun.(2016).Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime.Chin. Opt. Lett.,14(5).
MLA Zhang, Kui,et al."Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime".Chin. Opt. Lett. 14.5(2016).

入库方式: OAI收割

来源:上海光学精密机械研究所

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