Pixelated source optimization for optical lithography via particle swarm optimization
文献类型：期刊论文
| 作者 | Li, Sikun; Yang, Chaoxing; Wang, Lei; Yan, Guanyong; Wang, Xiangzhao |
| 刊名 | J. Micro-Nanolithogr. MEMS MOEMS
 |
| 出版日期 | 2016 |
| 卷号 | 15期号:1 |
| 通讯作者 | wxz26267@siom.ac.cn |
| 英文摘要 | Source optimization is one of the key techniques for achieving higher resolution without increasing the complexity of mask design. An efficient source optimization approach is proposed on the basis of particle swarm optimization. The pixelated sources are encoded into particles, which are evaluated by using the pattern error as the fitness function. Afterward, the optimization is implemented by updating the velocities and positions of these particles. This approach is demonstrated using three mask patterns, including a periodic array of contact holes, a vertical line/space design, and a complicated pattern. The pattern errors are reduced by 69.6%, 51.5%, and 40.3%, respectively. Compared with the source optimization approach via genetic algorithm, the proposed approach leads to faster convergence while improving the image quality at the same time. Compared with the source optimization approach via gradient descent method, the proposed approach does not need the calculation of gradients, and it has a strong adaptation to various lithographic models, fitness functions, and resist models. The robustness of the proposed approach to initial sources is also verified. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) |
| 收录类别 | SCI |
| 资助信息 | National Natural Science Foundation of China [61275207, 61205102, 61474129, 61405210] |
| WOS记录号 | WOS:000374540300008 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/27530]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | Li, Sikun,Yang, Chaoxing,Wang, Lei,et al. Pixelated source optimization for optical lithography via particle swarm optimization[J]. J. Micro-Nanolithogr. MEMS MOEMS,2016,15(1). |
| APA | Li, Sikun,Yang, Chaoxing,Wang, Lei,Yan, Guanyong,&Wang, Xiangzhao.(2016).Pixelated source optimization for optical lithography via particle swarm optimization.J. Micro-Nanolithogr. MEMS MOEMS,15(1). |
| MLA | Li, Sikun,et al."Pixelated source optimization for optical lithography via particle swarm optimization".J. Micro-Nanolithogr. MEMS MOEMS 15.1(2016). |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。