Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image
文献类型：期刊论文
| 作者 | Zhu, Boer; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Shen, Lina; Duan, Lifeng |
| 刊名 | Appl. Optics
 |
| 出版日期 | 2016 |
| 卷号 | 55期号:12页码:3192 |
| 通讯作者 | wxz26267@siom.ac.cn |
| 英文摘要 | A wavefront aberration measurement method for a hyper-NA lithographic projection lens by use of an aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and a vector imaging model, as well as by considering the polarization properties. As a result, the wavefront aberrations of the hyper-NA lithographic projection lens are measured accurately. The lithographic simulator PROLITH is used to validate the accuracies of the wavefront aberration measurement and analyze the impact of the polarization rotation of illumination on the accuracy of the wavefront aberration measurement, as well as the degree of polarized light and the sample interval of aerial images. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z(5) - Z(37)) with a maximum error of less than 0.00085 lambda. (C) 2016 Optical Society of America |
| 收录类别 | SCI |
| 资助信息 | National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129] |
| WOS记录号 | WOS:000374388600043 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/27546]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | Zhu, Boer,Wang, Xiangzhao,Li, Sikun,et al. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image[J]. Appl. Optics,2016,55(12):3192. |
| APA | Zhu, Boer,Wang, Xiangzhao,Li, Sikun,Yan, Guanyong,Shen, Lina,&Duan, Lifeng.(2016).Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image.Appl. Optics,55(12),3192. |
| MLA | Zhu, Boer,et al."Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image".Appl. Optics 55.12(2016):3192. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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