Improving laser damage resistance of 355 nm high-reflective coatings by co-evaporated interfaces
文献类型:期刊论文
作者 | Xing, Huanbin; Zhu, Meiping; Chai, Yingjie; Yi, Kui; Sun, Jian; Cui, Yun; Shao, Jianda |
刊名 | Opt. Lett.
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出版日期 | 2016 |
卷号 | 41期号:6页码:1253 |
通讯作者 | bree@siom.ac.cn ; chaiyingjie1990@siom.ac.cn |
英文摘要 | 355 nm high-reflective multilayer coatings with or without coevaporated interfaces (CEIs) were prepared by electron beam evaporation under the same deposition condition. Their transmission spectra, surface roughness, and mechanical stress properties were evaluated. Elemental composition analysis of the multilayer interfaces was performed using x-ray photoelectron spectroscopy, and laser-induced damage thresholds were obtained in both 1-on-1 and 300-on-1 testing modes. The coatings with CEIs reveal a lower mechanical stress and a higher laser damage resistance when irradiated with high laser fluence, and the corresponding damage modeling indicates that CEIs can significantly decrease defect density. The resulting damage morphologies show that CEI coatings can significantly suppress coating delamination and exhibit a "bulk-like" damage behavior, demonstrating better damage performance against high-power lasers. (C) 2016 Optical Society of America |
收录类别 | SCI |
资助信息 | Youth Innovation Promotion Association of the Chinese Academy of Sciences; National Natural Science Foundation of China (NSFC) [61505227, 61405225] |
WOS记录号 | WOS:000373042600046 |
源URL | [http://ir.siom.ac.cn/handle/181231/28106] ![]() |
专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
作者单位 | 中国科学院上海光学精密机械研究所 |
推荐引用方式 GB/T 7714 | Xing, Huanbin,Zhu, Meiping,Chai, Yingjie,et al. Improving laser damage resistance of 355 nm high-reflective coatings by co-evaporated interfaces[J]. Opt. Lett.,2016,41(6):1253. |
APA | Xing, Huanbin.,Zhu, Meiping.,Chai, Yingjie.,Yi, Kui.,Sun, Jian.,...&Shao, Jianda.(2016).Improving laser damage resistance of 355 nm high-reflective coatings by co-evaporated interfaces.Opt. Lett.,41(6),1253. |
MLA | Xing, Huanbin,et al."Improving laser damage resistance of 355 nm high-reflective coatings by co-evaporated interfaces".Opt. Lett. 41.6(2016):1253. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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