Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect
文献类型：期刊论文
| 作者 | Zhang Dongping; Xia Zhilin; Zhu Maodong; Li Yan; Zhang Weili; Cai Xingmin; Ye Fan; Liang Guangxing; Zheng Zhuanghao; Fan Ping |
| 刊名 | J. Wuhan Univ. Technol.-Mat. Sci. Edit.
 |
| 出版日期 | 2017 |
| 卷号 | 32期号:5页码:1057 |
| 通讯作者 | ahzhangdp@163.com ; xiazhilin@whut.edu.cn |
| 英文摘要 | Al2O3/SiO2 multilayer high-reflective (HR) mirrors at 355 nm were prepared by electron beam evaporation, and post-irradiated with Ar/O mixture plasma. The surface defect density, reflective spectra, and laser-induced damage characteristics were measured using optical microscopy, spectrophotometry, a damage testing system, and scanning electron microscopy (SEM), respectively. The results indicated that moderate-time of irradiation enhanced the laser-induced damage threshold (LIDT) of the mirror, but prolonged irradiation produced surface defects, resulting in LIDT degradation. LIDT of the mirrors initially increased and subsequently decreased with the plasma processing time. SEM damage morphologies of the mirrors revealed that nanoscale absorbing defects in sub-layers was one of the key factors limiting the improvement of LIDT in 355 nm HR mirror. |
| 收录类别 | SCI |
| 资助信息 | National Natural Science Foundation of China [11174208]; NSAF [U1430121]; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966] |
| WOS记录号 | WOS:000412950000011 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/28122]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | Zhang Dongping,Xia Zhilin,Zhu Maodong,et al. Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect[J]. J. Wuhan Univ. Technol.-Mat. Sci. Edit.,2017,32(5):1057. |
| APA | Zhang Dongping.,Xia Zhilin.,Zhu Maodong.,Li Yan.,Zhang Weili.,...&Fan Ping.(2017).Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect.J. Wuhan Univ. Technol.-Mat. Sci. Edit.,32(5),1057. |
| MLA | Zhang Dongping,et al."Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect".J. Wuhan Univ. Technol.-Mat. Sci. Edit. 32.5(2017):1057. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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