General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination
文献类型：期刊论文
| 作者 | Zhu, Boer; Shen, Lina; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Zhang, Heng |
| 刊名 | J. Opt. Soc. Am. A-Opt. Image Sci. Vis.
 |
| 出版日期 | 2016 |
| 卷号 | 33期号:6页码:1112 |
| 通讯作者 | wxz26267@siom.ac.cn |
| 英文摘要 | With the shrinking of the critical dimension, the impact of polarization aberration on lithographic imaging becomes increasingly prominent. In this paper, the linear relationships between the image placement error and odd Pauli-Zernike polarization aberrations, as well as those between the best focus shift and even Pauli-Zernike polarization aberrations, are established by analyzing the imaging of the alternating phase-shifting mask. The relational expressions of the polarization aberration sensitivities ( PAS) and the polarization angle of illumination are obtained based on these linear relationships. Then the expressions for the zero-value points and extremum points of the PAS are derived, and the impact of the polarization angle of illumination on the PAS is analyzed. The derived analytical expressions match the simulation results well; these can be used to analyze the detrimental impact of polarization aberration on lithographic imaging and provide a theoretical basis for exploring polarization aberration measurement and control techniques. (C)2016 Optical Society of America |
| 收录类别 | SCI |
| 资助信息 | National Natural Science Foundation of China (NSFC) [61275207, 61205102, 61474129, 61405210] |
| WOS记录号 | WOS:000377513300013 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/28495]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | Zhu, Boer,Shen, Lina,Wang, Xiangzhao,et al. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination[J]. J. Opt. Soc. Am. A-Opt. Image Sci. Vis.,2016,33(6):1112. |
| APA | Zhu, Boer,Shen, Lina,Wang, Xiangzhao,Li, Sikun,Yan, Guanyong,&Zhang, Heng.(2016).General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination.J. Opt. Soc. Am. A-Opt. Image Sci. Vis.,33(6),1112. |
| MLA | Zhu, Boer,et al."General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination".J. Opt. Soc. Am. A-Opt. Image Sci. Vis. 33.6(2016):1112. |
入库方式： OAI收割
来源：上海光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。