Programmable uniformity correction by using plug-in finger arrays in advanced lithography system
文献类型：期刊论文
| 作者 | Zhang, Yunbo; Zhu, Jing; Yang, Baoxi; Zeng, Aijun; Huang, Huijie; Cheng, Weilin |
| 刊名 | Opt. Commun.
 |
| 出版日期 | 2017 |
| 卷号 | 392页码:77 |
| 通讯作者 | huanghuijie@siom.ac.cn |
| 英文摘要 | Illumination integrated non-uniformity (IINU) is one of the key factors to determine the resolution and Critical Dimension Uniformity (CDU) which are important performance parameters in advanced lithography system. To further reduce the IINU, uniformity correction technology has been adopted. In this paper, an approach of programmable uniformity correction with higher flexibility and better correction capability is proposed. The method is composed of variable attenuation correction element arrays which are inserted into the edge of an illumination field to shield the energy through programming. Based on the proposed method, a programmable uniformity correction unit is applied to an illumination optical system. The simulation results show that the value of the corrected IINU reaches less than 0.25%, which satisfies the requirements of IINU hi advanced lithography system, and the energy loss is less than 1.1%. It verifies the higher flexibility and better correction capability of the proposed method. |
| 资助信息 | International Science & Technology Cooperation Programs of China [2011DER10010, 2012DFG51590]; Science and Technology Commission of Shanghai Municipality [14YF1406300]; National Science and Technology Major Project of China [2011ZX02402] |
| 收录类别 | SCI |
| WOS记录号 | WOS:000395604500015 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/28521]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | Zhang, Yunbo,Zhu, Jing,Yang, Baoxi,et al. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system[J]. Opt. Commun.,2017,392:77. |
| APA | Zhang, Yunbo,Zhu, Jing,Yang, Baoxi,Zeng, Aijun,Huang, Huijie,&Cheng, Weilin.(2017).Programmable uniformity correction by using plug-in finger arrays in advanced lithography system.Opt. Commun.,392,77. |
| MLA | Zhang, Yunbo,et al."Programmable uniformity correction by using plug-in finger arrays in advanced lithography system".Opt. Commun. 392(2017):77. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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