Heavily N-doped monolayer graphene electrodes used for high-performance N-channel polymeric thin film transistors
文献类型:期刊论文
作者 | Zhou, Guoqing; Pan, Guoxing; Wei, Lingzhi; Li, Tian![]() ![]() |
刊名 | RSC ADVANCES
![]() |
出版日期 | 2016 |
卷号 | 6期号:96页码:93855-93862 |
DOI | 10.1039/c6ra20496a |
文献子类 | Article |
英文摘要 | Recently graphene attracted much attention as a promising electrode material for organic field effect transistors (OFETs). However the electrodes used in most of the graphene-based OFETs were prepared from pristine graphene which suffers from relatively low conductivity and poor controlling of work function. In this work, we report the N-doping by Cs2CO3 of the CVD-grown single-layer graphene (SLG) via a facial spin-coating process. The Cs2CO3-engineered SLGs exhibit a heavy and stable N-doping, as well as significantly decreased work function (3.9 eV) compared to pristine graphene. The doped graphene was used as the source/drain electrodes in the bottom-contact top-gated OFETs based on a good electron transporter poly{[N, N'-bis(2-octyldodecyl)-1,4,5,8-naphthalenedicarboximide-2,6-diyl]-alt-5,5'-(2,2'-bithiophene)} (P(NDI2OD-T2)). The polymeric FETs show an enhancement of electron mobility by a factor of 10, as well as a reduction of contact resistance compared to the devices using pristine graphene. It is attributed to a remarkable lowering of electron injection barrier at the polymer/graphene electrode due to the decreased work function of graphene. In addition, the microstructural observations reveal that the face-on molecular packing and morphological feature do not change for the P(NDI2OD-T2) films coated on the doped graphene electrodes compared to those on the SiO2 dielectric, in spite of a highly hydrophobic surface of the graphene. |
WOS关键词 | SINGLE-LAYER GRAPHENE ; FIELD-EFFECT TRANSISTORS ; LIGHT-EMITTING-DIODES ; ORGANIC SOLAR-CELLS ; CESIUM CARBONATE ; HIGH-MOBILITY ; SEMICONDUCTOR ; NANOPARTICLES ; EFFICIENT ; ALIGNMENT |
WOS研究方向 | Chemistry |
语种 | 英语 |
WOS记录号 | WOS:000385631900077 |
资助机构 | Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; Chinese Academy of Sciences (CAS) ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; National Nature Science Foundation of China (NSFC)(11074256 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 11574314 ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) ; 21301177) |
源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/30187] ![]() |
专题 | 合肥物质科学研究院_中科院强磁场科学中心 |
作者单位 | Chinese Acad Sci, High Field Magnet Lab, Hefei 230031, Peoples R China |
推荐引用方式 GB/T 7714 | Zhou, Guoqing,Pan, Guoxing,Wei, Lingzhi,et al. Heavily N-doped monolayer graphene electrodes used for high-performance N-channel polymeric thin film transistors[J]. RSC ADVANCES,2016,6(96):93855-93862. |
APA | Zhou, Guoqing,Pan, Guoxing,Wei, Lingzhi,Li, Tian,&Zhang, Fapei.(2016).Heavily N-doped monolayer graphene electrodes used for high-performance N-channel polymeric thin film transistors.RSC ADVANCES,6(96),93855-93862. |
MLA | Zhou, Guoqing,et al."Heavily N-doped monolayer graphene electrodes used for high-performance N-channel polymeric thin film transistors".RSC ADVANCES 6.96(2016):93855-93862. |
入库方式: OAI收割
来源:合肥物质科学研究院
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。