Transparent and water repellent ceria film grown by atomic layer deposition
文献类型:期刊论文
作者 | Lv, Qipeng1; Zhang, Shaoqian1; Deng, Songwen1; Xu, Yinsheng2; Li, Gang1; Li, Qingwei1; Jin, Yuqi1 |
刊名 | SURFACE & COATINGS TECHNOLOGY
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出版日期 | 2017-06-25 |
卷号 | 320页码:190-195 |
关键词 | Hydrophobic Atomic Layer Deposition Transparent Rare-earth Oxide Coatings |
DOI | 10.1016/j.surfcoat.2017.01.058 |
英文摘要 | Transparent and hydrophobic ceria film was fabricated by atomic layer deposition (ALD). The ceria coatings were characterized by goniometry, atomic force microscopy, X-ray photoelectron spectroscopy and variable angles spectroscopic ellipsometry. The hydrophobicity of the ceria coatings was investigated with water contact angles achieving as high as 105 degrees. The effect of annealing or surface relaxation on the hydrophobicity was studied. Surface chemistry analysis of the ceria surfaces was carried out to understand the surface treatment towards the wettability of the ALD coatings. The proposed ALD ceria film offers the advantages of hydrophobic coatings covering fine optical lens such as band-pass filter. (C) 2017 Published by Elsevier B.V. |
语种 | 英语 |
WOS记录号 | WOS:000402215000032 |
源URL | [http://cas-ir.dicp.ac.cn/handle/321008/152217] ![]() |
专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
作者单位 | 1.Chinese Acad Sci, Dalian Inst Chem Phys, Key Lab Chem Lasers, Dalian 116023, Peoples R China 2.Ningbo Univ, Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R China |
推荐引用方式 GB/T 7714 | Lv, Qipeng,Zhang, Shaoqian,Deng, Songwen,et al. Transparent and water repellent ceria film grown by atomic layer deposition[J]. SURFACE & COATINGS TECHNOLOGY,2017,320:190-195. |
APA | Lv, Qipeng.,Zhang, Shaoqian.,Deng, Songwen.,Xu, Yinsheng.,Li, Gang.,...&Jin, Yuqi.(2017).Transparent and water repellent ceria film grown by atomic layer deposition.SURFACE & COATINGS TECHNOLOGY,320,190-195. |
MLA | Lv, Qipeng,et al."Transparent and water repellent ceria film grown by atomic layer deposition".SURFACE & COATINGS TECHNOLOGY 320(2017):190-195. |
入库方式: OAI收割
来源:大连化学物理研究所
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