中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Transparent and water repellent ceria film grown by atomic layer deposition

文献类型:期刊论文

作者Lv, Qipeng1; Zhang, Shaoqian1; Deng, Songwen1; Xu, Yinsheng2; Li, Gang1; Li, Qingwei1; Jin, Yuqi1
刊名SURFACE & COATINGS TECHNOLOGY
出版日期2017-06-25
卷号320页码:190-195
关键词Hydrophobic Atomic Layer Deposition Transparent Rare-earth Oxide Coatings
DOI10.1016/j.surfcoat.2017.01.058
英文摘要Transparent and hydrophobic ceria film was fabricated by atomic layer deposition (ALD). The ceria coatings were characterized by goniometry, atomic force microscopy, X-ray photoelectron spectroscopy and variable angles spectroscopic ellipsometry. The hydrophobicity of the ceria coatings was investigated with water contact angles achieving as high as 105 degrees. The effect of annealing or surface relaxation on the hydrophobicity was studied. Surface chemistry analysis of the ceria surfaces was carried out to understand the surface treatment towards the wettability of the ALD coatings. The proposed ALD ceria film offers the advantages of hydrophobic coatings covering fine optical lens such as band-pass filter. (C) 2017 Published by Elsevier B.V.
语种英语
WOS记录号WOS:000402215000032
源URL[http://cas-ir.dicp.ac.cn/handle/321008/152217]  
专题大连化学物理研究所_中国科学院大连化学物理研究所
作者单位1.Chinese Acad Sci, Dalian Inst Chem Phys, Key Lab Chem Lasers, Dalian 116023, Peoples R China
2.Ningbo Univ, Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R China
推荐引用方式
GB/T 7714
Lv, Qipeng,Zhang, Shaoqian,Deng, Songwen,et al. Transparent and water repellent ceria film grown by atomic layer deposition[J]. SURFACE & COATINGS TECHNOLOGY,2017,320:190-195.
APA Lv, Qipeng.,Zhang, Shaoqian.,Deng, Songwen.,Xu, Yinsheng.,Li, Gang.,...&Jin, Yuqi.(2017).Transparent and water repellent ceria film grown by atomic layer deposition.SURFACE & COATINGS TECHNOLOGY,320,190-195.
MLA Lv, Qipeng,et al."Transparent and water repellent ceria film grown by atomic layer deposition".SURFACE & COATINGS TECHNOLOGY 320(2017):190-195.

入库方式: OAI收割

来源:大连化学物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。