中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Oxygen vacancy effects in HfO2 - based resistive switching memory: First principle study

文献类型:期刊论文

作者Dai, Yuehua1,2; Pan, Zhiyong1,2; Wang, Feifei1,2; Li, Xiaofeng3
刊名AIP ADVANCES
出版日期2016-08-01
卷号6期号:8页码:1-10
DOI10.1063/1.4961229
文献子类Article
英文摘要The work investigated the shape and orientation of oxygen vacancy clusters in HfO2-base resistive random access memory (ReRAM) by using the first-principle method based on the density functional theory. Firstly, the formation energy of different local Vo clusters was calculated in four established orientation systems. Then, the optimized orientation and charger conductor shape were identified by comparing the isosurface plots of partial charge density, formation energy, and the highest isosurface value of oxygen vacancy. The calculated results revealed that the [010] orientation was the optimal migration path of Vo, and the shape of system D4 was the best charge conductor in HfO2, which effectively influenced the SET voltage, formation voltage and the ON/OFF ratio of the device. Afterwards, the PDOS of Hf near Vo and total density of states of the system D4_010 were obtained, revealing the composition of charge conductor was oxygen vacancy instead of metal Hf. Furthermore, the migration barriers of the Vo hopping between neighboring unit cells were calculated along four different orientations. The motion was proved along [010] orientation. The optimal circulation path for Vo migration in the HfO2 super-cell was obtained. (C) 2016 Author(s).
WOS关键词OXIDE
WOS研究方向Science & Technology - Other Topics ; Materials Science ; Physics
语种英语
WOS记录号WOS:000383909100053
资助机构National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106) ; National Natural Science Foundation of China(61376106)
源URL[http://ir.hfcas.ac.cn:8080/handle/334002/24250]  
专题合肥物质科学研究院_信息中心
作者单位1.Anhui Univ, Inst Elect, Hefei 230601, Anhui, Peoples R China
2.Anhui Univ, Informat Project, Hefei 230601, Anhui, Peoples R China
3.Chinese Acad Sci, Hefei Inst Phys Sci, Internet Network Informat Ctr, Hefei 230031, Peoples R China
推荐引用方式
GB/T 7714
Dai, Yuehua,Pan, Zhiyong,Wang, Feifei,et al. Oxygen vacancy effects in HfO2 - based resistive switching memory: First principle study[J]. AIP ADVANCES,2016,6(8):1-10.
APA Dai, Yuehua,Pan, Zhiyong,Wang, Feifei,&Li, Xiaofeng.(2016).Oxygen vacancy effects in HfO2 - based resistive switching memory: First principle study.AIP ADVANCES,6(8),1-10.
MLA Dai, Yuehua,et al."Oxygen vacancy effects in HfO2 - based resistive switching memory: First principle study".AIP ADVANCES 6.8(2016):1-10.

入库方式: OAI收割

来源:合肥物质科学研究院

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