Acceleration of Kirkendall effect processes in silicon nanospheres using magnetic fields
文献类型：期刊论文
| 作者 | Yuecheng Bian1,2,3; Wei Ding4; Lin Hu1 ; Zongwei Ma1; Long Cheng1; Ranran Zhang1; Xuebin Zhu4; Xianwu Tang4; Jianming Dai4; Jin Bai4
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| 刊名 | CrystEngComm
 |
| 出版日期 | 2018 |
| 卷号 | 20期号:6页码:710-715 |
| 语种 | 英语 |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/33924]  |
| 专题 | 合肥物质科学研究院_中科院强磁场科学中心 |
| 通讯作者 | Zhigao Sheng |
| 作者单位 | 1.Chinese Acad Sci, High Magnet Field Lab, Anhui Prov Key Lab Condensed Matter Phys Extreme, Hefei 230031, Anhui, Peoples R China 2.Univ Sci & Technol China, Hefei 230026, Anhui, Peoples R China 3.Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R China 4.Chinese Acad Sci, Inst Solid State Phys, Key Lab Mat Phys, Hefei 230031, Anhui, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yuecheng Bian,Wei Ding,Lin Hu,et al. Acceleration of Kirkendall effect processes in silicon nanospheres using magnetic fields[J]. CrystEngComm,2018,20(6):710-715. |
| APA | Yuecheng Bian.,Wei Ding.,Lin Hu.,Zongwei Ma.,Long Cheng.,...&Zhigao Sheng.(2018).Acceleration of Kirkendall effect processes in silicon nanospheres using magnetic fields.CrystEngComm,20(6),710-715. |
| MLA | Yuecheng Bian,et al."Acceleration of Kirkendall effect processes in silicon nanospheres using magnetic fields".CrystEngComm 20.6(2018):710-715. |
入库方式： OAI收割
来源：合肥物质科学研究院
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