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Superhydrophobic graphenic carbon nanowalls fabricated by one-step PECVD
文献类型：期刊论文
| 作者 | Gao, J. M.1; Song, X. F.1,2; Hu, J.1; Guo, S. C.1; Fang, L.1; Wu, F.1; Wei, D. P.2,3 |
| 刊名 | MATERIALS LETTERS
 |
| 出版日期 | 2016-12-01 |
| 卷号 | 184页码:273-277 |
| ISSN号 | 0167-577X |
| 关键词 | Graphenic carbon nanowalls Superhydrophobic Chemical vapor deposition Facile fabrication |
| DOI | 10.1016/j.matlet.2016.07.127 |
| 通讯作者 | Hu, J ; Fang, L (reprint author), Chongqing Univ, Coll Phys, State Key Lab Mech Transmiss, Chongqing 400044, Peoples R China. ; Wei, DP (reprint author), Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing Key Lab Multiscale Mfg Technol, Chongqing 400714, Peoples R China. ; Wei, DP (reprint author), Chongqing Engn Res Ctr Graphene Film Mfg, Chongqing 401331, Peoples R China. |
| 英文摘要 | Graphenic carbon nanowalls (GCNWs) were prepared on Quartz, silicon and silicon dioxide by plasma enhanced chemical vapor deposition (PECVD), respectively, and the superhydrophobicity was obtained after the surface modification with triethoxyoctylsilane (KH-832). Then, the effect of the preparation pressure (30, 40 and 50 Pa) on the wetting properties of GCNWs on Si substrate was investigated. It is found that the water contact angle (CA) of GCNWS fabricated at 50 Pa without the surface modification are 155, which means that the superhydrophobic GCNWs can be obtained by just optimizing PECVD preparation parameters. The increase of GCNWs hydrophobicity with the PECVD base pressure could be attributed to the increased size of the nanosheets on GCNWs and the decreased surface free energy. The facile one-step fabrication of superhydrophobic surface provides a novel method to control the hydrophobicity of GCNWs, and the superhydrophobic GCNWs may serve as an important candidate for the fabrication of microfludic devices and embedded biomaterials. (C) 2016 Elsevier B.V. All rights reserved. |
| 资助项目 | "863 Plan"[2015AA034801] ; NSFC[11374359] ; NSFC[11304405] ; NSFC[11544010] ; NSFC[11547305] ; NSCF of Chongqing[cstc2013jcyjA50031] ; NSCF of Chongqing[cstc2015jcyjA50035] ; NSCF of Chongqing[cstc2015jcyjA1660] ; Fundamental Research Funds for the Central Universities[CDJZR14135502] ; Fundamental Research Funds for the Central Universities[106112014CDJZR14300050] ; Fundamental Research Funds for the Central Universities[106112016CDJZR288805] ; Fundamental Research Funds for the Central Universities[106112015CDJXY300002] ; Sharing Fund of Large-scale Equipment of CQU[201512150017] ; Sharing Fund of Large-scale Equipment of CQU[201512150029] ; Sharing Fund of Large-scale Equipment of CQU[201512150030] |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| 出版者 | ELSEVIER SCIENCE BV |
| WOS记录号 | WOS:000386316900066 |
| 源URL | [http://119.78.100.138/handle/2HOD01W0/2953]  |
| 专题 | 微纳制造与系统集成研究中心 |
| 通讯作者 | Hu, J.; Fang, L.; Wei, D. P. |
| 作者单位 | 1.Chongqing Univ, Coll Phys, State Key Lab Mech Transmiss, Chongqing 400044, Peoples R China 2.Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing Key Lab Multiscale Mfg Technol, Chongqing 400714, Peoples R China 3.Chongqing Engn Res Ctr Graphene Film Mfg, Chongqing 401331, Peoples R China |
| 推荐引用方式 GB/T 7714 | Gao, J. M.,Song, X. F.,Hu, J.,et al. Superhydrophobic graphenic carbon nanowalls fabricated by one-step PECVD[J]. MATERIALS LETTERS,2016,184:273-277. |
| APA | Gao, J. M..,Song, X. F..,Hu, J..,Guo, S. C..,Fang, L..,...&Wei, D. P..(2016).Superhydrophobic graphenic carbon nanowalls fabricated by one-step PECVD.MATERIALS LETTERS,184,273-277. |
| MLA | Gao, J. M.,et al."Superhydrophobic graphenic carbon nanowalls fabricated by one-step PECVD".MATERIALS LETTERS 184(2016):273-277. |
入库方式： OAI收割
来源：重庆绿色智能技术研究院
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