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Electrochemical behavior of TiAlSiN hard coatings synthesized by a multi-plasma immersion ion implantation and deposition technique

文献类型：期刊论文

作者Wang, Gengzhu1; Xie, Zhiwen1,2; Chen, Tian2; Chen, Zhenyu3; Song, Xiaohang4; Gao, Xu1; Yu, Xiaoguang1; Song, Hua1
刊名THIN SOLID FILMS
出版日期2015-06-01
卷号584页码:222-227
关键词TiAlSiN coatings Microstructure Corrosion Plasma immersion ion implantation and deposition
ISSN号0040-6090
DOI10.1016/j.tsf.2015.02.027
通讯作者Xie, ZW (reprint author), 185 Qianshan Midrd, Anshan, Liaoning, Peoples R China.
英文摘要The TiAlSiN coatings are synthesized by a multi-plasma immersion ion implantation and deposition technique. The microstructure and the electrochemical behavior of the as-deposited coatings are investigated by using X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy and electrochemical tests. These studies reveal that huge lattice distortions and dislocations emerge in the coating after introducing a small amount of Al component. These structural defects can facilitate the corrosion process of the TiAlN coating. The TiAlN coating exhibits a worse corrosion resistance performance than the TiN coating. The TiAlSiN coating has a two phase microstructure, nc-TiAlN/a-Si3N4. The grain size is greatly reduced after introducing Si component, whereas the portion of the a-Si3N4 phase increases as the amount of Si increases in the coating. The reduced grain size and the increased percentage of the a-Si3N4 phase in the TiAlSiN coatings enhance their ability in corrosion resistance. The TiAlSiN coating with a larger amount of Si shows better corrosion resistance performance. This research provides a comprehensive understanding of the relationship between the microstructure and the electrochemical behavior of the TiAlSiN hard coatings. (C) 2015 Elsevier B.V. All rights reserved.
资助项目National Natural Science Foundation of China[51401201] ; Chinese Academy of Sciences Western Light[Y32Z010F10] ; R&d program of Shanghai Academy Spaceflight Technology[51318030303] ; Chongqing Research of Application Foundation and Advanced Technology[cstc2014jcyjA50009]
WOS研究方向Materials Science ; Physics
语种英语
WOS记录号WOS:000353813100041
出版者ELSEVIER SCIENCE SA
源URL[http://119.78.100.138/handle/2HOD01W0/1633]  
专题机器人与3D打印技术创新中心
通讯作者Xie, Zhiwen
作者单位1.Univ Sci & Technol Liaoning, Anshan 114051, Peoples R China
2.Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing 401122, Peoples R China
3.Inst Power Sources, Key Lab Power Sources, Tianjin 300381, Peoples R China
4.Shanghai Aerosp Equipments Mfg, Shanghai 401122, Peoples R China
推荐引用方式
GB/T 7714		 Wang, Gengzhu,Xie, Zhiwen,Chen, Tian,et al. Electrochemical behavior of TiAlSiN hard coatings synthesized by a multi-plasma immersion ion implantation and deposition technique[J]. THIN SOLID FILMS,2015,584:222-227.
APA Wang, Gengzhu.,Xie, Zhiwen.,Chen, Tian.,Chen, Zhenyu.,Song, Xiaohang.,...&Song, Hua.(2015).Electrochemical behavior of TiAlSiN hard coatings synthesized by a multi-plasma immersion ion implantation and deposition technique.THIN SOLID FILMS,584,222-227.
MLA Wang, Gengzhu,et al."Electrochemical behavior of TiAlSiN hard coatings synthesized by a multi-plasma immersion ion implantation and deposition technique".THIN SOLID FILMS 584(2015):222-227.

入库方式： OAI收割

来源：重庆绿色智能技术研究院

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