Mechanism of force mode dip-pen nanolithography
文献类型：期刊论文
| 作者 | Yang, Haijun1,2,3; Xie, Hui4; Wu, Haixia1; Rong, Weibin4; Sun, Lining4; Guo, Shouwu1; Wang, Huabin5
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| 刊名 | JOURNAL OF APPLIED PHYSICS
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| 出版日期 | 2014-05-07 |
| 卷号 | 115期号:17页码:6 |
| ISSN号 | 0021-8979 |
| DOI | 10.1063/1.4875665 |
| 通讯作者 | Yang, HJ (reprint author), Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat, Minist Educ, Res Inst Micro Nano Sci & Technol, Shanghai 200240, Peoples R China. |
| 英文摘要 | In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data. (C) 2014 AIP Publishing LLC. |
| 资助项目 | NSFC[11105090] ; NSFC[90923041] |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| 出版者 | AMER INST PHYSICS |
| WOS记录号 | WOS:000335643700645 |
| 源URL | [http://119.78.100.138/handle/2HOD01W0/1321]  |
| 专题 | 太赫兹技术研究中心 |
| 通讯作者 | Yang, Haijun |
| 作者单位 | 1.Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat, Minist Educ, Res Inst Micro Nano Sci & Technol, Shanghai 200240, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Appl Phys, Interfacial Water Div, Shanghai 201800, Peoples R China 3.Chinese Acad Sci, Shanghai Inst Appl Phys, Key Lab Interfacial Phys & Technol, Shanghai 201800, Peoples R China 4.Harbin Inst Technol, State Key Lab Robot & Syst, Harbin 150080, Peoples R China 5.Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Ctr Tetrahertz Res, Chongqing 400714, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang, Haijun,Xie, Hui,Wu, Haixia,et al. Mechanism of force mode dip-pen nanolithography[J]. JOURNAL OF APPLIED PHYSICS,2014,115(17):6. |
| APA | Yang, Haijun.,Xie, Hui.,Wu, Haixia.,Rong, Weibin.,Sun, Lining.,...&Wang, Huabin.(2014).Mechanism of force mode dip-pen nanolithography.JOURNAL OF APPLIED PHYSICS,115(17),6. |
| MLA | Yang, Haijun,et al."Mechanism of force mode dip-pen nanolithography".JOURNAL OF APPLIED PHYSICS 115.17(2014):6. |
入库方式： OAI收割
来源：重庆绿色智能技术研究院
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