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Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography

文献类型：期刊论文

作者Yang, Zheng1,2; Zhang, Zhiyou3; Wu, Peng1,2; Xia, Liangping1,2; Yin, Shaoyun1,2; Du, Jinglei3
刊名MICROELECTRONIC ENGINEERING
出版日期2016-03-25
卷号154页码:8-11
关键词Lithography Subwavelength Nanostructure fabrication Waveguide Single-mode-resonance
ISSN号0167-9317
DOI10.1016/j.mee.2016.01.004
通讯作者Yang, Z (reprint author), Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing, Peoples R China. ; Yang, Z (reprint author), Chongqing Key Lab Multiscale Mfg Technol, Chongqing, Peoples R China.
英文摘要A high exposure depth nanolithography technology is presented. In the proposed scheme, the photoresist layer is used as a waveguide. With a subwavelength grating (SWG) coupling structure, the incident light is efficiently coupled into the photoresist waveguide, in which the single-mode-resonance (SMR) interference field is formed. Different from other interference lithography, the new scheme can realize high resolution and high exposure depth simultaneously. In this paper, the theoretical model of the SMR interference is established to analyze the light field distribution in the photoresist The simulation result shows that interference pattern with period smaller than 140 nm and depth larger than 900 nm can be obtained in the photoresist, by using 441 nm incident light and 276 nm period grating coupling structure. (c) 2016 Elsevier B.V. All rights reserved.
资助项目National Natural Science Foundation of China[61275061] ; National Natural Science Foundation of China[61475199]
WOS研究方向Engineering ; Science & Technology - Other Topics ; Optics ; Physics
语种英语
WOS记录号WOS:000378363400002
出版者ELSEVIER SCIENCE BV
源URL[http://119.78.100.138/handle/2HOD01W0/2587]  
专题集成光电技术研究中心
通讯作者Yang, Zheng
作者单位1.Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing, Peoples R China
2.Chongqing Key Lab Multiscale Mfg Technol, Chongqing, Peoples R China
3.Sichuan Univ, Sch Phys Sci & Technol, Inst Nanophoton Technol, Chengdu 610064, Peoples R China
推荐引用方式
GB/T 7714		 Yang, Zheng,Zhang, Zhiyou,Wu, Peng,et al. Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography[J]. MICROELECTRONIC ENGINEERING,2016,154:8-11.
APA Yang, Zheng,Zhang, Zhiyou,Wu, Peng,Xia, Liangping,Yin, Shaoyun,&Du, Jinglei.(2016).Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography.MICROELECTRONIC ENGINEERING,154,8-11.
MLA Yang, Zheng,et al."Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography".MICROELECTRONIC ENGINEERING 154(2016):8-11.

入库方式： OAI收割

来源：重庆绿色智能技术研究院

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