Investigating the TDDB lifetime growth mechanism caused by proton irradiation in partially depleted SOI devices
文献类型:期刊论文
作者 | Ma, T (Ma, Teng); Yu, XF (Yu, Xuefeng)![]() ![]() |
刊名 | MICROELECTRONICS RELIABILITY
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出版日期 | 2018 |
卷号 | 81期号:2页码:112-116 |
关键词 | Reliability Proton Irradiation Radiation Induced Leakage Current (Rilc) Time-dependent Dielectric Breakdown (Tddb) Total Ionizing Does (Tid) |
ISSN号 | 0026-2714 |
DOI | 10.1016/j.microrel.2017.12.016 |
英文摘要 | We have investigated the effects of proton irradiation on the subsequent time-dependent dielectric breakdown (TDDB) lifetimes of partially depleted (PD) SOI devices. Our results show that the TDDB lifetimes of the devices increased after proton irradiation and the amplitude increased with the intensification of the total ionizing dose (TID) damage. Moreover, the radiation-induced leakage currents (RILC) and the TDDB lifetimes of the irradiated devices by protons were dependent on TID damage but independent of energy of protons. We interpreted these results and mechanisms in terms of the effects of radiation-induced traps on the stressing current during the reliability testing, which may be significant to further expand the understanding of the radiation effects of the devices used in the space radiation environment. |
WOS记录号 | WOS:000425576300011 |
源URL | [http://ir.xjipc.cas.cn/handle/365002/5242] ![]() |
专题 | 新疆理化技术研究所_中国科学院特殊环境功能材料与器件重点试验室 新疆理化技术研究所_材料物理与化学研究室 |
作者单位 | 1.Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Key Lab Funct Mat & Devices Special Environm, Urumqi 830011, Peoples R China 2.Xinjiang Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China 3.Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
推荐引用方式 GB/T 7714 | Ma, T ,Yu, XF ,Cui, JW ,et al. Investigating the TDDB lifetime growth mechanism caused by proton irradiation in partially depleted SOI devices[J]. MICROELECTRONICS RELIABILITY,2018,81(2):112-116. |
APA | Ma, T .,Yu, XF .,Cui, JW .,Zheng, QW .,Zhou, H .,...&Guo, Q .(2018).Investigating the TDDB lifetime growth mechanism caused by proton irradiation in partially depleted SOI devices.MICROELECTRONICS RELIABILITY,81(2),112-116. |
MLA | Ma, T ,et al."Investigating the TDDB lifetime growth mechanism caused by proton irradiation in partially depleted SOI devices".MICROELECTRONICS RELIABILITY 81.2(2018):112-116. |
入库方式: OAI收割
来源:新疆理化技术研究所
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