High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination
文献类型：期刊论文
| 作者 | Ji, Jiaxin1,2; Meng, Yonggang2; Hu, Yueqiang2; Xu, Jian3; Li, Shayu3; Yang, Guoqiang3 |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2017-07-24 |
| 卷号 | 25期号:15页码:17571-17580 |
| 英文摘要 | Plasmonic focusing was investigated in concentric rings with a central pillar under linearly polarized illumination with a specific incident angle. When changing the incident angle of linearly polarized beam between 6 and 15 degree away from the normal direction, the focal spot size can keep a steady value of 37 nm, smaller than the focal spot with the radially polarized beam at the same excited condition, 45 nm. Combining this with the highspeed near-field photolithography technology, we demonstrated a plasmonic lithography with 16.85 nm linewidth on both organic and inorganic photo-resists in large scale at scanning speeds up to 11.3 m/s. This inclined linearly polarized illumination is easy to realize in a prototype of near-field photolithography system, and it opens a new cost effective approach towards the next generation lithography for nano-manufacturing. (C) 2017 Optical Society of America |
| 语种 | 英语 |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/39318]  |
| 专题 | 化学研究所_光化学实验室 |
| 作者单位 | 1.China Univ Petr, Coll Mech & Elect Engn, Qingdao 257061, Peoples R China 2.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China 3.Chinese Acad Sci, Inst Chem, CAS Key Lab Photochem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ji, Jiaxin,Meng, Yonggang,Hu, Yueqiang,et al. High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination[J]. OPTICS EXPRESS,2017,25(15):17571-17580. |
| APA | Ji, Jiaxin,Meng, Yonggang,Hu, Yueqiang,Xu, Jian,Li, Shayu,&Yang, Guoqiang.(2017).High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination.OPTICS EXPRESS,25(15),17571-17580. |
| MLA | Ji, Jiaxin,et al."High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination".OPTICS EXPRESS 25.15(2017):17571-17580. |
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来源：化学研究所
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