Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays
文献类型:期刊论文
作者 | Liu, JP; Li, X; Chen, S; Zhang, SC; Xie, SS; Xu, C; Chen, YF; Deng, B; Mao, CW |
刊名 | JOURNAL OF SYNCHROTRON RADIATION
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出版日期 | 2017 |
卷号 | 24页码:595-599 |
关键词 | Condenser Uniform Illumination Gratings Nanofabrication Hard X-ray Optics |
ISSN号 | 1600-5775 |
DOI | 10.1107/S1600577517002247 |
文献子类 | 期刊论文 |
英文摘要 | In the development of full-field transmission X-ray microscopy for basic study in science and technology, a condenser capable of providing intense illumination with high uniformity and stability on tested specimens in order to achieve high-quality images is essential. The latest design of a square-shaped condenser based on diffractive gratings has demonstrated promising uniformity in illumination. This paper describes in more detail the development of such a beam shaper for hard X-rays at 10keV with regard to its design, manufacture and optical characterization. The effect of the grating profile on the diffracted intensity has been theoretically predicted by numerical simulation using the finite-difference time-domain method. Based on this, the limitations of the grating-based condenser are discussed. |
语种 | 英语 |
WOS记录号 | WOS:000400385400006 |
源URL | [http://ir.sinap.ac.cn/handle/331007/27392] ![]() |
专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
推荐引用方式 GB/T 7714 | Liu, JP,Li, X,Chen, S,et al. Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays[J]. JOURNAL OF SYNCHROTRON RADIATION,2017,24:595-599. |
APA | Liu, JP.,Li, X.,Chen, S.,Zhang, SC.,Xie, SS.,...&Mao, CW.(2017).Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays.JOURNAL OF SYNCHROTRON RADIATION,24,595-599. |
MLA | Liu, JP,et al."Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays".JOURNAL OF SYNCHROTRON RADIATION 24(2017):595-599. |
入库方式: OAI收割
来源:上海应用物理研究所
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