Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
文献类型：期刊论文
| 作者 | Xue, CF; Zhao, J; Wu, YQ; Yu, HN; Yang, SM; Wang, LS; Zhao, WC; Wu, Q; Zhu, ZC; Liu, B |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2017 |
| 卷号 | 425期号:-页码:553-557 |
| 关键词 | Extreme-ultraviolet Nanoparticles Resolution Arrays Light |
| ISSN号 | 0169-4332 |
| DOI | 10.1016/j.apsusc.2017.07.010 |
| 文献子类 | 期刊论文 |
| 英文摘要 | Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved. |
| WOS关键词 | EXTREME-ULTRAVIOLET ; NANOPARTICLES ; RESOLUTION ; ARRAYS ; LIGHT |
| 语种 | 英语 |
| WOS记录号 | WOS:000410609400068 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/28654]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Xue, CF,Zhao, J,Wu, YQ,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. APPLIED SURFACE SCIENCE,2017,425(-):553-557. |
| APA | Xue, CF.,Zhao, J.,Wu, YQ.,Yu, HN.,Yang, SM.,...&Tai, RZ.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.APPLIED SURFACE SCIENCE,425(-),553-557. |
| MLA | Xue, CF,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".APPLIED SURFACE SCIENCE 425.-(2017):553-557. |
入库方式： OAI收割
来源：上海应用物理研究所
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