Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering
文献类型：期刊论文
| 作者 | Han, ZB; Wang, CJ; Cheng, GJ; Zhang, HL; Su, RR; Duan, YM; Gao, J; Ni, XJ; Ye, BJ; Zhang, W |
| 刊名 | JOURNAL OF ALLOYS AND COMPOUNDS
 |
| 出版日期 | 2018 |
| 卷号 | 744页码:778-784 |
| 关键词 | Molecular-dynamics Simulation Titanium Tritide Temperature Evolution Alloy He |
| ISSN号 | 0925-8388 |
| DOI | 10.1016/j.jallcom.2018.02.022 |
| 文献子类 | 期刊论文 |
| 英文摘要 | TiH2 and yttrium-doped TiH2 alloy films with different helium concentrations prepared by magnetron sputtering were investigated using ion beam analysis (IBA), X-ray diffraction (XRD), thermal helium desorption spectrometry (THDS), positron annihilation spectroscopy (PAS) and nanoindentation techniques. It was found that through increasing the concentration of doped Y atoms, strong release peaks of helium will be found at about 820 K. The release at 820 K corresponds to the binding energy of the helium state on grain boundary indicating that the majority of the helium exists in the grain boundaries. In addition, the results of XRD and nanoindentation indicate that the doping of Y in the TiH2 films can improve the hardness and the elastic modulus of the films because of the fine-grain strengthening caused by the decreased size of TiH2 grains. (C) 2018 Elsevier B.V. All rights reserved. |
| 语种 | 英语 |
| WOS记录号 | WOS:000427513400096 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/28988]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Han, ZB 2.Wang, CJ 3.Cheng, GJ 4.Zhang, HL 5.Su, RR 6.Duan, YM 7.Gao, J 8.Ni, XJ 9.Ye, BJ 10.Zhang, W |
| 推荐引用方式 GB/T 7714 | Han, ZB,Wang, CJ,Cheng, GJ,et al. Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2018,744:778-784. |
| APA | Han, ZB.,Wang, CJ.,Cheng, GJ.,Zhang, HL.,Su, RR.,...&Shi, LQ.(2018).Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering.JOURNAL OF ALLOYS AND COMPOUNDS,744,778-784. |
| MLA | Han, ZB,et al."Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering".JOURNAL OF ALLOYS AND COMPOUNDS 744(2018):778-784. |
入库方式： OAI收割
来源：上海应用物理研究所
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