中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers

文献类型:期刊论文

作者Jiang, H; Wang, H; Zhu, JT; Xue, CF; Zhang, JY; Tian, NX; Li, AG
刊名JOURNAL OF SYNCHROTRON RADIATION
出版日期2018
卷号25页码:785-792
关键词Nitride Thin-films X-ray Mirrors Surface-morphology Optical-surfaces Growth Roughness Layer Microstructure Reflectivity Spectroscopy
ISSN号1600-5775
DOI10.1107/S1600577518005143
文献子类期刊论文
英文摘要The interior structure, morphology and ligand surrounding of a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers are determined by various hard X-ray techniques in order to reveal the growth characteristics of Cr-based thin films. A Cr monolayer presents a three-stage growth mode with sudden changes occurring at a layer thickness of similar to 2 nm and beyond 6 nm. Cr-based multilayers are proven to have denser structures due to interfacial diffusion and layer growth mode. Cr/C and Cr/Sc multilayers have different interfacial widths resulting from asymmetry, degree of crystallinity and thermal stability. Cr/Sc multilayers present similar ligand surroundings to Cr foil, whereas Cr/C multilayers are similar to Cr monolayers. The aim of this study is to help understand the structural evolution regulation versus layer thickness and to improve the deposition technology of Cr-based thin films, in particular for obtaining stable Cr-based multilayers with ultra-short periods.
语种英语
WOS记录号WOS:000431150000016
源URL[http://ir.sinap.ac.cn/handle/331007/29188]  
专题上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位1.Jiang, H
2.Wang, H
3.Zhu, JT
4.Xue, CF
5.Zhang, JY
6.Tian, NX
7.Li, AG
推荐引用方式
GB/T 7714
Jiang, H,Wang, H,Zhu, JT,et al. Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers[J]. JOURNAL OF SYNCHROTRON RADIATION,2018,25:785-792.
APA Jiang, H.,Wang, H.,Zhu, JT.,Xue, CF.,Zhang, JY.,...&Li, AG.(2018).Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers.JOURNAL OF SYNCHROTRON RADIATION,25,785-792.
MLA Jiang, H,et al."Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers".JOURNAL OF SYNCHROTRON RADIATION 25(2018):785-792.

入库方式: OAI收割

来源:上海应用物理研究所

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