Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model
文献类型：期刊论文
| 作者 | Liu, Z. W.; S. Jiang; X. T. Li; Y. Song; W. H. Li and Bayanheshig |
| 刊名 | Optics Express
 |
| 出版日期 | 2017 |
| 卷号 | 25期号:9 |
| 英文摘要 | A profile of an X-axis stage mirror results in a phase error of gratings in Scanning Beam Interference Lithography. Traditional methods of measuring the profile require extra probes and another large stage mirror on Y-axis, or requires other operations such as rotating measured object to adjust the zero-adjustment errors. This paper introduces a three-probe system removing the need for Y-axis optical path structure and proposes a bidirectional integration model to solve the problem of zero-adjustment error, simplifying the optical path structure and the measurement process. This method is confirmed by theoretical analysis and experimental results, which is better than traditional methods and can also be used in other application fields of three-point method. (C) 2017 Optical Society of America |
| 语种 | 英语 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/59110]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Liu, Z. W.,S. Jiang,X. T. Li,et al. Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model[J]. Optics Express,2017,25(9). |
| APA | Liu, Z. W.,S. Jiang,X. T. Li,Y. Song,&W. H. Li and Bayanheshig.(2017).Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model.Optics Express,25(9). |
| MLA | Liu, Z. W.,et al."Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model".Optics Express 25.9(2017). |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。